Shih-Hsiang (Shane) Lin, Marko Simicic, Nicolas Pantano
{"title":"为先进的 3D 片上系统制定高效的 ESD 保护策略","authors":"Shih-Hsiang (Shane) Lin, Marko Simicic, Nicolas Pantano","doi":"10.1038/s44287-024-00071-4","DOIUrl":null,"url":null,"abstract":"2.5D/3D technologies require designers to reduce electrostatic discharge (ESD) protection of the internal I/O interfaces. To avoid over-design of ESD protection, designers require a more fundamental understanding of the ESD events that occur at this level. Here we present insights, practical guidelines and research directions for circuit designers and suppliers of bonding tools.","PeriodicalId":501701,"journal":{"name":"Nature Reviews Electrical Engineering","volume":"1 7","pages":"429-431"},"PeriodicalIF":0.0000,"publicationDate":"2024-07-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Towards efficient ESD protection strategies for advanced 3D systems-on-chip\",\"authors\":\"Shih-Hsiang (Shane) Lin, Marko Simicic, Nicolas Pantano\",\"doi\":\"10.1038/s44287-024-00071-4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"2.5D/3D technologies require designers to reduce electrostatic discharge (ESD) protection of the internal I/O interfaces. To avoid over-design of ESD protection, designers require a more fundamental understanding of the ESD events that occur at this level. Here we present insights, practical guidelines and research directions for circuit designers and suppliers of bonding tools.\",\"PeriodicalId\":501701,\"journal\":{\"name\":\"Nature Reviews Electrical Engineering\",\"volume\":\"1 7\",\"pages\":\"429-431\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-07-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nature Reviews Electrical Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.nature.com/articles/s44287-024-00071-4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature Reviews Electrical Engineering","FirstCategoryId":"1085","ListUrlMain":"https://www.nature.com/articles/s44287-024-00071-4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Towards efficient ESD protection strategies for advanced 3D systems-on-chip
2.5D/3D technologies require designers to reduce electrostatic discharge (ESD) protection of the internal I/O interfaces. To avoid over-design of ESD protection, designers require a more fundamental understanding of the ESD events that occur at this level. Here we present insights, practical guidelines and research directions for circuit designers and suppliers of bonding tools.