使用聚噻吩衍生物的可见光响应型全有机聚氨酯抗菌涂层

IF 2.2 4区 化学 Q3 CHEMISTRY, PHYSICAL
Chunbo Liu, Xiaohuan Li, Paul A. Charpentier, William Z. Xu, Haiyong Guo
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引用次数: 0

摘要

由于耐多药感染的广泛存在,可见光响应抗菌涂层在抗菌应用中具有重要意义。本文合成并评估了一种全有机聚[2,11′-噻吩-乙烯-噻吩-alt-(2,5-(3-羧基)-噻吩](PTET-T-COOH)/聚氨酯(PU)涂层的光催化消毒性能。该涂层由聚氨酯保护层和光活性层(PTET-T-COOH)组成,使用异氰酸酯基团作为连接剂制备,然后通过滴注法制造。根据 ATR-FTIR 和 XPS 分析研究了 PTET-T-COOH 与 NCO 端聚氨酯之间的化学联系。该研究为制备环保、廉价的抗菌表面提供了一个有效的平台。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Visible light-responsive all-organic polyurethane antibacterial coatings using a polythiophene derivative

Visible light-responsive all-organic polyurethane antibacterial coatings using a polythiophene derivative

Visible light-responsive all-organic polyurethane antibacterial coatings using a polythiophene derivative

Visible light-responsive antimicrobial coatings are of importance for antibacterial applications owing to widespread multidrug-resistant infections. Herein, the photocatalytic disinfection performance of an all-organic poly[2,11′-thiophene-ethylene-thiophene-alt-(2,5-(3-carboxyl)-thiophene] (PTET-T-COOH)/polyurethane (PU) coating was synthesized and evaluated. The coating consists of both a protective PU layer and a photoactive layer (PTET-T-COOH), which was prepared using isocyanate groups as linkers, then fabricated by drop-casting. The chemical linkage between PTET-T-COOH and NCO-terminated PU was researched based on ATR-FTIR and XPS analyses. The developed coating demonstrated good photocatalytic bactericidal performance on S. aureus under visible-light irradiation for 6 h. This study provided an effective platform for fabricating environmental-friendly and cheap antimicrobial surfaces.

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来源期刊
Colloid and Polymer Science
Colloid and Polymer Science 化学-高分子科学
CiteScore
4.60
自引率
4.20%
发文量
111
审稿时长
2.2 months
期刊介绍: Colloid and Polymer Science - a leading international journal of longstanding tradition - is devoted to colloid and polymer science and its interdisciplinary interactions. As such, it responds to a demand which has lost none of its actuality as revealed in the trends of contemporary materials science.
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