V. I. Kolesnikov, O. V. Kudryakov, A. I. Voropaev, I. V. Kolesnikov, V. N. Varavka, M. S. Lifar, A. A. Guda, D. S. Manturov, E. S. Novikov
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引用次数: 0
摘要
摘要 介绍了解决离子等离子涂层摩擦学特性预测形成这一科学和应用问题的方案之一。这个问题是通过建立和分析碳涂层数据库来解决的。这项工作的研究对象是沉积在钢基体上的离子等离子体类金刚石涂层(DLC)。研究表明,使用氮气而不是氢气来稳定碳涂层,不仅能确保 DLC 厚度稳定在 1.0-1.5 μm 的水平,而且还是在沉积过程中调节涂层摩擦学特性的一个重要而方便的技术参数。根据摩擦系数 μ 的预测值和实验值以及样品路径长度 L 的数据,确定了技术参数 %N 和 λ 的最佳值区间。根据已确定的最佳应用模式获得的所研究的离子等离子 DLC 可推荐用于摩擦条件下,相当于在摩擦载荷 F ≈ 10 N 的条件下进行的摩擦学测试。
Formation and Prediction of the Properties of Ion-Plasma Diamond-Like Coatings under Nitrogen Stabilization
One of the options for solving the scientific and applied problem of the predicted formation of ion-plasma coating tribological characteristics is presented. The problem is solved by creating and analyzing a carbon coating database. The object of research in this work is ion-plasma diamond-like coatings (DLCs) deposited on a steel substrate. It is shown that the use of nitrogen instead of hydrogen to stabilize carbon coatings not only ensures stable thicknesses of DLCs at the level of 1.0–1.5 μm, but also serves as an important and convenient technological parameter for regulating the tribological coating characteristics during deposition. Based on the predicted and experimental values of friction coefficient μ and data on sample path length L, the intervals of optimal values of technological parameters %N and λ are determined. The studied ion-plasma DLCs, obtained according to the established optimal application modes, can be recommended for application under friction conditions equivalent to the tribological tests carried out at friction load F ≈ 10 N.
期刊介绍:
Journal of Friction and Wear is intended to bring together researchers and practitioners working in tribology. It provides novel information on science, practice, and technology of lubrication, wear prevention, and friction control. Papers cover tribological problems of physics, chemistry, materials science, and mechanical engineering, discussing issues from a fundamental or technological point of view.