新指数状态方程与半导体的相关性

IF 1.4 4区 综合性期刊 Q2 MULTIDISCIPLINARY SCIENCES
Abhay P. Srivastava, Brijesh K. Pandey, A. K. Gupta, Mukesh Upadhyay
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引用次数: 0

摘要

等温状态方程通常用于确定 Ge、FeSi2、SiC、AIN、SnS、MoN 和 GaN 等半导体的压缩压力。通过应用 Murnaghan、Kholiya 和新开发的状态方程,这一领域取得了进展。在低压缩时,Murnaghan 和 Kholiya 方程得出的结果与实验数据相当,但在高压缩时,Kholiya 方程的结果有所下降,而 Murnaghan 方程的结果则有所上升。然而,新开发的状态方程显示出与实验值惊人的相似性,仅有微小偏差,揭示了其预测半导体在低压缩和高压缩下的热弹性特性的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

The Relevance of the New Exponential Equation of State for Semiconductors

The Relevance of the New Exponential Equation of State for Semiconductors

The isothermal equation of state has been commonly used to determine the compression-dependent pressure of semiconductors like Ge, FeSi2, SiC, AIN, SnS, MoN, and GaN. Progress in this field has been achieved through the application of Murnaghan, Kholiya, and newly developed equations of state. While the Murnaghan and Kholiya equations yielded comparable results to experimental data at low compression, the Kholiya equation had to reduce results at high compression, while the Murnaghan equation had increasing results. However, the newly developed equation of state displayed a striking similarity to experimental values with only minor deviations, revealing its potential to forecast the thermos-elastic properties of semiconductors at both low and high compressions.

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来源期刊
CiteScore
4.00
自引率
5.90%
发文量
122
审稿时长
>12 weeks
期刊介绍: The aim of this journal is to foster the growth of scientific research among Iranian scientists and to provide a medium which brings the fruits of their research to the attention of the world’s scientific community. The journal publishes original research findings – which may be theoretical, experimental or both - reviews, techniques, and comments spanning all subjects in the field of basic sciences, including Physics, Chemistry, Mathematics, Statistics, Biology and Earth Sciences
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