{"title":"通过硬 X 射线掠入射衍射图样测量孤立晶格的三维 1 纳米分辨率的研究","authors":"Tetsuya Hoshino, Sadao Aoki, Masahide Itoh, Hiroshi Itoh, Takato Inoue, Satoshi Matsuyama","doi":"10.1117/1.oe.63.11.111804","DOIUrl":null,"url":null,"abstract":"Scatterometry has been put into practical use for microstructure measurement of ultra-large-scale integration due to its high process compatibility. On the other hand, its application has been limited to periodic structures. By applying this method to isolated systems and using hard X-rays, it may be possible to significantly exceed a resolution of 10 nm, which is the limit of conventional optical measurement. We demonstrate the feasibility of this measurement by rigorous calculations. For this purpose, we measured the intensity of specular reflection and noise at the beamline of hard X-ray radiation. The virtual target is a 15-nm-wide lattice. The signal-to-noise ratio is low enough for a lattice with a period of 25 nm but 10 times higher for an isolated lattice.","PeriodicalId":19561,"journal":{"name":"Optical Engineering","volume":"15 1","pages":""},"PeriodicalIF":1.1000,"publicationDate":"2024-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Examination of measurement by hard X-ray grazing incidence diffraction patterns of isolated lattices for 3D 1-nm resolution\",\"authors\":\"Tetsuya Hoshino, Sadao Aoki, Masahide Itoh, Hiroshi Itoh, Takato Inoue, Satoshi Matsuyama\",\"doi\":\"10.1117/1.oe.63.11.111804\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Scatterometry has been put into practical use for microstructure measurement of ultra-large-scale integration due to its high process compatibility. On the other hand, its application has been limited to periodic structures. By applying this method to isolated systems and using hard X-rays, it may be possible to significantly exceed a resolution of 10 nm, which is the limit of conventional optical measurement. We demonstrate the feasibility of this measurement by rigorous calculations. For this purpose, we measured the intensity of specular reflection and noise at the beamline of hard X-ray radiation. The virtual target is a 15-nm-wide lattice. The signal-to-noise ratio is low enough for a lattice with a period of 25 nm but 10 times higher for an isolated lattice.\",\"PeriodicalId\":19561,\"journal\":{\"name\":\"Optical Engineering\",\"volume\":\"15 1\",\"pages\":\"\"},\"PeriodicalIF\":1.1000,\"publicationDate\":\"2024-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Engineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1117/1.oe.63.11.111804\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Engineering","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1117/1.oe.63.11.111804","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
摘要
散射测量法因其高度的工艺兼容性,已被实际用于超大规模集成的微观结构测量。另一方面,其应用仅限于周期性结构。通过将这种方法应用于孤立系统并使用硬 X 射线,有可能大大超过 10 纳米的分辨率,而这正是传统光学测量的极限。我们通过严格的计算证明了这种测量方法的可行性。为此,我们测量了硬 X 射线辐射光束线的镜面反射强度和噪声。虚拟目标是一个 15 纳米宽的晶格。对于周期为 25 纳米的晶格,信噪比足够低,但对于孤立晶格,信噪比则高出 10 倍。
Examination of measurement by hard X-ray grazing incidence diffraction patterns of isolated lattices for 3D 1-nm resolution
Scatterometry has been put into practical use for microstructure measurement of ultra-large-scale integration due to its high process compatibility. On the other hand, its application has been limited to periodic structures. By applying this method to isolated systems and using hard X-rays, it may be possible to significantly exceed a resolution of 10 nm, which is the limit of conventional optical measurement. We demonstrate the feasibility of this measurement by rigorous calculations. For this purpose, we measured the intensity of specular reflection and noise at the beamline of hard X-ray radiation. The virtual target is a 15-nm-wide lattice. The signal-to-noise ratio is low enough for a lattice with a period of 25 nm but 10 times higher for an isolated lattice.
期刊介绍:
Optical Engineering publishes peer-reviewed papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.