Yanyan Qiu, Yixin Yu, Shanshan Wang and Menglu Chen*,
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Advances in Quantum Dot Direct Photolithographic Patterning
Quantum Dots (QDs) with unique electrical and optical properties have wide applications on patterned or pixelated devices such as display devices, integrated photoelectric devices, etc. However, conventional patterning methods have some obvious drawbacks such as complex processing, blurred film boundaries, and degradation on the photophysical properties. Recently, direct photolithographic patterning has appeared as a novel strategy to realize high-resolution patterning solids and high-performance patterned devices. In this review, we summarize the research progress on the direct photolithographic patterning on QDs as well as their applications. We also discuss the current challenges and future development in this field.
期刊介绍:
ACS Materials Letters is a journal that publishes high-quality and urgent papers at the forefront of fundamental and applied research in the field of materials science. It aims to bridge the gap between materials and other disciplines such as chemistry, engineering, and biology. The journal encourages multidisciplinary and innovative research that addresses global challenges. Papers submitted to ACS Materials Letters should clearly demonstrate the need for rapid disclosure of key results. The journal is interested in various areas including the design, synthesis, characterization, and evaluation of emerging materials, understanding the relationships between structure, property, and performance, as well as developing materials for applications in energy, environment, biomedical, electronics, and catalysis. The journal has a 2-year impact factor of 11.4 and is dedicated to publishing transformative materials research with fast processing times. The editors and staff of ACS Materials Letters actively participate in major scientific conferences and engage closely with readers and authors. The journal also maintains an active presence on social media to provide authors with greater visibility.