补偿商用反射电子式原子探针的图像畸变

IF 2.9 4区 工程技术 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Martina Heller, Benedict Ott, Peter Felfer
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引用次数: 0

摘要

在原子探针层析成像中,数据的空间分辨率和精确度主要取决于二维探测器数据的三维重建。使用反射电子管的原子探针具有更高的质量分辨能力,因此必须包括反射电子管成像特性的模型。然而,对于现代广角反射仪来说,这些成像特性并不简单,需要根据所使用的反射仪来确定。这通常是由仪器制造商完成的,由于仪器设计的专有性,成像特性对用户来说是不透明的。在本文中,我们提供了一种确定反射仪成像特性的方法,这种方法可以在商用仪器上轻松实现。该方法可为用户提供一个转换函数,将所提供的探测器数据(其中可能已包含一些修正)转换为放置在反射仪前的虚拟探测器。从这里开始,三维重建就可以类似于直线飞行路径仪器一样进行了。此外,还为 Imago/CAMECA LEAP 3000、4000、5000 和 6000 系列仪器提供了校正算法和参考数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Compensating Image Distortions in a Commercial Reflectron-Type Atom Probe.

In atom probe tomography, the spatial resolution and accuracy of the data critically depend on the 3D reconstruction of the 2D detector data. Atom probes with a reflectron have an improved mass resolving power and must include a model of the imaging properties of the reflectron. However, for modern wide-angle reflectron instruments, these imaging properties are not trivial and need to be determined for the reflectron used. This is typically done by the instrument manufacturer, and due to the proprietary nature of the instrument design, the imaging properties are opaque to the user. In this paper, we provide a method to determine the imaging properties of a reflectron that can easily be carried out on commercial instrumentation. This method is used to provide the user with a transformation function from the provided detector data, which can already contain some corrections applied, to a virtual detector placed before the reflectron. From there on, 3D reconstructions can be carried out analogous to straight flight path instruments. Correction algorithms and reference data for Imago/CAMECA LEAP 3000, 4000, 5000, and 6000 series instruments are also provided.

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来源期刊
Microscopy and Microanalysis
Microscopy and Microanalysis 工程技术-材料科学:综合
CiteScore
1.10
自引率
10.70%
发文量
1391
审稿时长
6 months
期刊介绍: Microscopy and Microanalysis publishes original research papers in the fields of microscopy, imaging, and compositional analysis. This distinguished international forum is intended for microscopists in both biology and materials science. The journal provides significant articles that describe new and existing techniques and instrumentation, as well as the applications of these to the imaging and analysis of microstructure. Microscopy and Microanalysis also includes review articles, letters to the editor, and book reviews.
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