Dharmaray Nedalgi , Saroja V. Siddamal , S.S. Kerur
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2×VDD IO buffer with 1×VDD devices considering hot-carrier and gate-oxide reliability issues
This paper presents circuit for signaling I/O buffer to solve the gate-oxide and hot-carrier reliability issues without consuming any active static power. The design is verified for a range of loads varying from 4 pF to 200 pF with operating speed ranging from 12 Mbps to 500 Mbps. The proposed circuit is implemented in 16 nm FinFET technology using 1.8 V thick gate devices. The design can be used in any CMOS technology for signaling I/O buffer to reduce hot-carrier effect and to avoid gate-oxide reliability issues.
期刊介绍：
Integration''s aim is to cover every aspect of the VLSI area, with an emphasis on cross-fertilization between various fields of science, and the design, verification, test and applications of integrated circuits and systems, as well as closely related topics in process and device technologies. Individual issues will feature peer-reviewed tutorials and articles as well as reviews of recent publications. The intended coverage of the journal can be assessed by examining the following (non-exclusive) list of topics:
Specification methods and languages; Analog/Digital Integrated Circuits and Systems; VLSI architectures; Algorithms, methods and tools for modeling, simulation, synthesis and verification of integrated circuits and systems of any complexity; Embedded systems; High-level synthesis for VLSI systems; Logic synthesis and finite automata; Testing, design-for-test and test generation algorithms; Physical design; Formal verification; Algorithms implemented in VLSI systems; Systems engineering; Heterogeneous systems.
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