盘形惰性气体 MHD 发生器中等离子体行为的数值研究

IF 0.5 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC
Ork Kimsor, Yoshihiro Okuno
{"title":"盘形惰性气体 MHD 发生器中等离子体行为的数值研究","authors":"Ork Kimsor,&nbsp;Yoshihiro Okuno","doi":"10.1002/ecj.12445","DOIUrl":null,"url":null,"abstract":"<p>Plasma behavior in cesium-seeded argon (Ar/Cs) and xenon-seeded argon (Ar/Xe) disk-shaped MHD generators are compared under almost the same working conditions using r-θ two-dimensional simulation. For both working gases, uniform plasma occurs at the optimum load resistance, and the power outputs are the same under an identical inlet ionization degree. For Ar/Cs, plasma is stable and uniform in the range of electron temperature of 4300–5800 K basically according to the linear perturbation theory. In the actual plasma in the MHD generator, however, the uniform plasma still can be maintained even at higher electron temperatures due to the low three-body recombination coefficient of Ar. For Ar/Xe, on the other hand, uniform plasma is maintained when the characteristic time of the electron number density is longer than the residence time of the working gas where the electron temperature is around 4300–8600 K, even though unstable plasma is suggested from the linear perturbation theory.</p>","PeriodicalId":50539,"journal":{"name":"Electronics and Communications in Japan","volume":"107 2","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2024-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Numerical study of plasma behavior in a disk-shaped noble gas MHD generator\",\"authors\":\"Ork Kimsor,&nbsp;Yoshihiro Okuno\",\"doi\":\"10.1002/ecj.12445\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Plasma behavior in cesium-seeded argon (Ar/Cs) and xenon-seeded argon (Ar/Xe) disk-shaped MHD generators are compared under almost the same working conditions using r-θ two-dimensional simulation. For both working gases, uniform plasma occurs at the optimum load resistance, and the power outputs are the same under an identical inlet ionization degree. For Ar/Cs, plasma is stable and uniform in the range of electron temperature of 4300–5800 K basically according to the linear perturbation theory. In the actual plasma in the MHD generator, however, the uniform plasma still can be maintained even at higher electron temperatures due to the low three-body recombination coefficient of Ar. For Ar/Xe, on the other hand, uniform plasma is maintained when the characteristic time of the electron number density is longer than the residence time of the working gas where the electron temperature is around 4300–8600 K, even though unstable plasma is suggested from the linear perturbation theory.</p>\",\"PeriodicalId\":50539,\"journal\":{\"name\":\"Electronics and Communications in Japan\",\"volume\":\"107 2\",\"pages\":\"\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2024-05-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electronics and Communications in Japan\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/ecj.12445\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronics and Communications in Japan","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/ecj.12445","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

在几乎相同的工作条件下,使用 r-θ 二维模拟比较了铯氩(Ar/Cs)和氙氩(Ar/Xe)盘形 MHD 发生器中的等离子体行为。对于这两种工作气体,在最佳负载电阻下会产生均匀的等离子体,并且在相同的入口电离度下输出功率相同。对于 Ar/Cs,根据线性扰动理论,等离子体在电子温度 4300-5800 K 范围内基本稳定和均匀。但在 MHD 发生器中的实际等离子体中,由于氩的三体重组系数较低,即使在较高的电子温度下也能保持等离子体的均匀性。而对于氩/氙来说,当电子数密度的特征时间长于工作气体的停留时间时,即使线性扰动理论认为等离子体不稳定,但在电子温度约为 4300-8600 K 时,等离子体仍能保持均匀。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Numerical study of plasma behavior in a disk-shaped noble gas MHD generator

Plasma behavior in cesium-seeded argon (Ar/Cs) and xenon-seeded argon (Ar/Xe) disk-shaped MHD generators are compared under almost the same working conditions using r-θ two-dimensional simulation. For both working gases, uniform plasma occurs at the optimum load resistance, and the power outputs are the same under an identical inlet ionization degree. For Ar/Cs, plasma is stable and uniform in the range of electron temperature of 4300–5800 K basically according to the linear perturbation theory. In the actual plasma in the MHD generator, however, the uniform plasma still can be maintained even at higher electron temperatures due to the low three-body recombination coefficient of Ar. For Ar/Xe, on the other hand, uniform plasma is maintained when the characteristic time of the electron number density is longer than the residence time of the working gas where the electron temperature is around 4300–8600 K, even though unstable plasma is suggested from the linear perturbation theory.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Electronics and Communications in Japan
Electronics and Communications in Japan 工程技术-工程:电子与电气
CiteScore
0.60
自引率
0.00%
发文量
45
审稿时长
6-12 weeks
期刊介绍: Electronics and Communications in Japan (ECJ) publishes papers translated from the Transactions of the Institute of Electrical Engineers of Japan 12 times per year as an official journal of the Institute of Electrical Engineers of Japan (IEEJ). ECJ aims to provide world-class researches in highly diverse and sophisticated areas of Electrical and Electronic Engineering as well as in related disciplines with emphasis on electronic circuits, controls and communications. ECJ focuses on the following fields: - Electronic theory and circuits, - Control theory, - Communications, - Cryptography, - Biomedical fields, - Surveillance, - Robotics, - Sensors and actuators, - Micromachines, - Image analysis and signal analysis, - New materials. For works related to the science, technology, and applications of electric power, please refer to the sister journal Electrical Engineering in Japan (EEJ).
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信