利用离轴电子全息技术比较 Zn-VI 半导体纳米线的平均内电势

Anitha Jose, Sarry Al-Turk, Harry E. Ruda, Simon P Watkins, Martha R McCartney, Cristina Cordoba, K. L. Kavanagh
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引用次数: 0

摘要

利用离轴电子全息(EH)技术,对一系列 Zn VI 族半导体纳米结构的平均内电势(MIP)V0 进行了实验测量。我们重新测量了 ZnS、ZnTe 和 ZnO 的数值,并为 ZnSe 和 ZnSSe 纳米线添加了新的数值。我们证实,MIP 随质量密度的增加而非线性增加,最低密度 ZnS 的 MIP 值为 12.4 ± 0.2 V,ZnSe 的 MIP 值随成分的增加而缓慢增加到 12.9 ± 0.2 V,ZnTe 的 MIP 值增加更快,最高密度 ZnO 的 MIP 值显著增加到 14.8 ± 0.3 V。已公布的 DFT 计算结果与这些测量结果相比较,其他阳离子家族(如 Ga-III-V)也有类似的趋势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparing the mean inner potential of Zn-VI semiconductor nanowires using off-axis electron holography
The mean inner potential (MIP), V0, for a series of Zn group VI semiconductor nanostructures were measured experimentally using off-axis electron holography (EH). Values for ZnS, ZnTe and ZnO were remeasured and new values were added for ZnSe and ZnSSe nanowires. We confirm that the MIP increases non-linearly with mass density beginning at 12.4 ± 0.2 V for the lowest density ZnS and slowly increasing with composition to 12.9 ± 0.2 V for ZnSe, more rapidly for ZnTe and with a significant increase to 14.8 ± 0.3 V for ZnO with the highest density. Published results from DFT calculations compared well to these measurements with similar trends apparent for other cation families such as the Ga-III-V.
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