Cheng-Cai Zhao, Eun-Bi Kim, Young-Jo Park, Govindasamy Logesh, Mi-Ju Kim, Jae-Wook Lee, Ho Jin Ma, Ha-Neul Kim, Jae-Woong Ko, Seog-Young Yoon
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引用次数: 0
摘要
系统研究了正硅酸四乙酯（TEOS）对钇铝石榴石（Y3Al5O12，钇铝石榴石 [YAG]）等离子刻蚀行为的影响。使用 TEOS 作为烧结添加剂，在相对较低的温度（1450°C）和 20 MPa 条件下对致密的 YAG 块状试样进行了 2 小时的热压烧结。使用入射等离子功率为 1500 W 的电感耦合等离子体刻蚀器对掺入不同 TEOS 含量的 YAG 陶瓷的刻蚀特性进行了评估，结果表明，添加 .3 wt.% TEOS 能最大程度地降低 YAG 陶瓷在等离子体刻蚀后的表面粗糙度。透射电子显微镜和 X 射线荧光测试表明，对于超掺 TEOS（≥.5 wt.%）的试样，在三重交界处由 TEOS 引发的富含硅的残留相促进了致密化，在等离子刻蚀过程中起到了凹坑引发点的作用，最终导致表面粗糙度增加。
Optimization of a TEOS addition on plasma resistance of YAG ceramics
The influence of tetraethyl orthosilicate (TEOS) on the plasma etching behavior of yttrium aluminum garnet (Y3Al5O12, yttrium aluminum garnet [YAG]) was systematically studied. Dense YAG bulk specimens were hot-press sintered at a relatively low temperature of 1450°C for 2 h under 20 MPa, using TEOS as a sintering additive. The etching properties of YAG ceramics, doped with different TEOS contents, were evaluated using an inductively coupled plasma etcher with an incident plasma power of 1500 W for up to 2 h. It was observed that the addition of .3 wt.% TEOS optimally reduced the surface roughness of YAG ceramics post-plasma etching. Transmission electron microscopy and X-ray fluorescence tests clarified that a densification-promoting TEOS-induced residual Si-rich phase at the triple junction for the over-doped TEOS (≥.5 wt.%) specimen acts as a pit-initiation site during plasma etching, which eventually results in increased surface roughness.
期刊介绍：
The International Journal of Applied Ceramic Technology publishes cutting edge applied research and development work focused on commercialization of engineered ceramics, products and processes. The publication also explores the barriers to commercialization, design and testing, environmental health issues, international standardization activities, databases, and cost models. Designed to get high quality information to end-users quickly, the peer process is led by an editorial board of experts from industry, government, and universities. Each issue focuses on a high-interest, high-impact topic plus includes a range of papers detailing applications of ceramics. Papers on all aspects of applied ceramics are welcome including those in the following areas:
Nanotechnology applications;
Ceramic Armor;
Ceramic and Technology for Energy Applications (e.g., Fuel Cells, Batteries, Solar, Thermoelectric, and HT Superconductors);
Ceramic Matrix Composites;
Functional Materials;
Thermal and Environmental Barrier Coatings;
Bioceramic Applications;
Green Manufacturing;
Ceramic Processing;
Glass Technology;
Fiber optics;
Ceramics in Environmental Applications;
Ceramics in Electronic, Photonic and Magnetic Applications;
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