{"title":"基于光诱导脱卤的原位直接光刻 CsPbBr3 量子点微图案用于高容量加密和防伪","authors":"Wanting Li, Manchun Wu, Haini Chen, Peng Zhang, Zhixiong Cai, Shunyou Cai, Feiming Li","doi":"10.1002/sstr.202400078","DOIUrl":null,"url":null,"abstract":"Fluorescent lead halide perovskite quantum dots (LH PQDs) micropatterns hold great potential for photonic applications. However, current photolithography for LH PQDs micropatterning is hindered by their incompatibility with traditional photolithography methods, which involve development processes using numerous solvents and exhibit poor stability due to the ionic characteristics of LH PQDs. Herein, a direct in situ photolithography to fabricate CsPbBr3 PQDs micropatterns based on ultraviolet‐C light‐driven debromination is developed. Using this approach, fluorescent CsPbBr3 PQDs micropatterns with high theoretical information storage capacity (up to 10750205) can be achieved in a single step, without the need for tedious development processes. Furthermore, the fabricated CsPbBr3 PQDs micropatterns show high stability, remaining undamaged even after immersion in water for 6 months. The combination of excellent optical properties, development‐free process, high stability, and low cost makes the in situ photolithography strategy very promising for patterning LH PQDs toward photonic integrations.","PeriodicalId":21841,"journal":{"name":"Small Structures","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity\",\"authors\":\"Wanting Li, Manchun Wu, Haini Chen, Peng Zhang, Zhixiong Cai, Shunyou Cai, Feiming Li\",\"doi\":\"10.1002/sstr.202400078\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Fluorescent lead halide perovskite quantum dots (LH PQDs) micropatterns hold great potential for photonic applications. However, current photolithography for LH PQDs micropatterning is hindered by their incompatibility with traditional photolithography methods, which involve development processes using numerous solvents and exhibit poor stability due to the ionic characteristics of LH PQDs. Herein, a direct in situ photolithography to fabricate CsPbBr3 PQDs micropatterns based on ultraviolet‐C light‐driven debromination is developed. Using this approach, fluorescent CsPbBr3 PQDs micropatterns with high theoretical information storage capacity (up to 10750205) can be achieved in a single step, without the need for tedious development processes. Furthermore, the fabricated CsPbBr3 PQDs micropatterns show high stability, remaining undamaged even after immersion in water for 6 months. The combination of excellent optical properties, development‐free process, high stability, and low cost makes the in situ photolithography strategy very promising for patterning LH PQDs toward photonic integrations.\",\"PeriodicalId\":21841,\"journal\":{\"name\":\"Small Structures\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Small Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1002/sstr.202400078\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Small Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/sstr.202400078","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity
Fluorescent lead halide perovskite quantum dots (LH PQDs) micropatterns hold great potential for photonic applications. However, current photolithography for LH PQDs micropatterning is hindered by their incompatibility with traditional photolithography methods, which involve development processes using numerous solvents and exhibit poor stability due to the ionic characteristics of LH PQDs. Herein, a direct in situ photolithography to fabricate CsPbBr3 PQDs micropatterns based on ultraviolet‐C light‐driven debromination is developed. Using this approach, fluorescent CsPbBr3 PQDs micropatterns with high theoretical information storage capacity (up to 10750205) can be achieved in a single step, without the need for tedious development processes. Furthermore, the fabricated CsPbBr3 PQDs micropatterns show high stability, remaining undamaged even after immersion in water for 6 months. The combination of excellent optical properties, development‐free process, high stability, and low cost makes the in situ photolithography strategy very promising for patterning LH PQDs toward photonic integrations.