基于光诱导脱卤的原位直接光刻 CsPbBr3 量子点微图案用于高容量加密和防伪

Wanting Li, Manchun Wu, Haini Chen, Peng Zhang, Zhixiong Cai, Shunyou Cai, Feiming Li
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引用次数: 0

摘要

荧光卤化铅过氧化物量子点(LH PQDs)微图案在光子应用方面具有巨大潜力。然而,目前用于 LH PQDs 微图案化的光刻技术因其与传统光刻方法不兼容而受到阻碍,传统光刻方法涉及使用大量溶剂的显影过程,并且由于 LH PQDs 的离子特性而表现出较低的稳定性。在此,我们开发了一种基于紫外 C 光驱动脱溴的直接原位光刻法来制造 CsPbBr3 PQDs 微图案。利用这种方法,无需繁琐的开发过程,只需一步就能实现具有高理论信息存储容量(高达 10750205)的荧光 CsPbBr3 PQDs 微图案。此外,制备的 CsPbBr3 PQDs 微图案显示出很高的稳定性,即使在水中浸泡 6 个月也不会损坏。出色的光学性能、免显影工艺、高稳定性和低成本的完美结合,使原位光刻技术在光子集成的 LH PQDs 图形化方面大有可为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity

Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity
Fluorescent lead halide perovskite quantum dots (LH PQDs) micropatterns hold great potential for photonic applications. However, current photolithography for LH PQDs micropatterning is hindered by their incompatibility with traditional photolithography methods, which involve development processes using numerous solvents and exhibit poor stability due to the ionic characteristics of LH PQDs. Herein, a direct in situ photolithography to fabricate CsPbBr3 PQDs micropatterns based on ultraviolet‐C light‐driven debromination is developed. Using this approach, fluorescent CsPbBr3 PQDs micropatterns with high theoretical information storage capacity (up to 10750205) can be achieved in a single step, without the need for tedious development processes. Furthermore, the fabricated CsPbBr3 PQDs micropatterns show high stability, remaining undamaged even after immersion in water for 6 months. The combination of excellent optical properties, development‐free process, high stability, and low cost makes the in situ photolithography strategy very promising for patterning LH PQDs toward photonic integrations.
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CiteScore
17.30
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