Chao-Ching Chiang, Hsiao-Hsuan Wan, Jian-Sian Li, Fan Ren, T. J. Yoo, Honggyu Kim, S. J. Pearton
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Sputtered p-NiO films were used to suppress gate leakage and produce a positive shift in gate voltage of AlGaN/GaN high electron mobility transistors for e-mode operation. A direct comparison with Schottky gate devices fabricated on the same wafer shows the utility of the NiO in increasing the on-off ratio and shifting the threshold voltage from -0.95 V (Schottky gated) to +0.9 V (NiO gated). The breakdown voltage was 780 V for a 40 µm drain-source separation. The sub-threshold swing decreased from 181 mV/dec for Schottky gate HEMTs to 128 mV/dec on NiO-gated devices. The simple fabrication process without any annealing or passivation steps shows the promise of NiO-gates for e-mode AlGaN/GaN HEMT operation.
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