探索 SiAlON 陶瓷中的原子尺度硼添加剂

Kade A. McGarrity, Priyatham Tumurugoti, Kaijie Ning, Christy George, Yonggang Yan, Kun Wang, Holly Shulman
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引用次数: 0

摘要

SiAlON 陶瓷在生物医学植入物和内燃机涡轮机等高风险应用领域备受关注。这项工作是更大规模研究的一部分,旨在利用原子或分子尺度的添加剂来控制 SiAlONs 的致密化、微结构和最终结构特性。在此,我们研究了氮化硅基陶瓷中硼的影响。本研究通过在起始粉末混合物中加入硼酸(H3BO3),展示了一种控制 SiAlONs 微结构发展的化学方法。拉曼光谱和 11B 固态魔角旋转核磁共振共同表明,烧结后,硼与氮以三倍配位形式存在于涡流氮化硼(t-BN)结构中。这项工作的结果表明,在 SiAlON 体系中加入硼并生成 t-BN 键,可使晶粒尺寸分布更窄,抑制钇铝硅酸盐等第二相,并最终提高抗折强度。一项单独的断裂谱研究表明,使用 3 wt% 硼酸制造的 SiAlON 显示出断裂源,如细微的表面缺陷或裂缝,而较低掺杂水平和未掺杂的 SiAlON 通常因缺陷(如夹杂物或大晶粒)而失效。有观点认为,晶间玻璃化学性质的改变以及由此产生的 t-BN 减少了通过晶界相的原子扩散,抑制了第二相的结晶以及β′-SiAlON 发展过程中经常出现的夸张晶粒生长。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Exploration of an atomic-scale boron additive in SiAlON ceramics

Exploration of an atomic-scale boron additive in SiAlON ceramics

SiAlON ceramics are of interest for high-risk applications such as biomedical implants and combustion engine turbines. This work is part of a larger study aimed at leveraging atomic- or molecular-scale additives to control the densification, microstructures, and ultimate structural properties of SiAlONs. Here, we investigate the effects of boron in silicon nitride-based ceramics. The present work demonstrates a possible chemical method for controlling the microstructural development of SiAlONs by incorporating boric acid (H3BO3) into the starting powder blend. Raman spectroscopy and 11B solid-state magic angle spinning nuclear magnetic resonance cooperatively indicate that after sintering, boron exists in threefold coordination with nitrogen in the turbostratic boron nitride (t-BN) structure. The results of this work indicate that the incorporation of boron and generation of t-BN bonding in the SiAlON system result in a narrower grain size distribution, a suppression of second phases such as yttrium aluminosilicates, and ultimately, increased flexure strength. A separate fractographic study showed that SiAlONs fabricated with 3 wt% boric acid exhibited fracture origins such as subtle surface flaws or cracks, while lower dopant levels and undoped SiAlONs typically failed from flaws such as inclusions or large grains. It is argued that the modification of the intergranular glass chemistry and resulting generation of t-BN reduces atomic diffusion through the grain boundary phase and inhibits the crystallization of second phases as well as exaggerated grain growth that often characterizes the development of β′-SiAlON.

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