Hanlin Du , Yueting Deng , Xingyu Hu , Juan Peng , Huan Hu , Yun Tang , Xu Ye , Jajun Ma , Junxiao Yang
{"title":"具有低 Dk 值和高分辨率光成像介电性能的全烃苯并环丁烯树脂","authors":"Hanlin Du , Yueting Deng , Xingyu Hu , Juan Peng , Huan Hu , Yun Tang , Xu Ye , Jajun Ma , Junxiao Yang","doi":"10.1016/j.reactfunctpolym.2024.105935","DOIUrl":null,"url":null,"abstract":"<div><p>Low dielectric photoinduced patterned materials have attracted extensive attention owing to their potential applications in integrated circuits and semiconductor devices. In this work, we synthesized a low dielectric polymer that can be used for photolithography. The monomer, 1-(4-vinylphenyl)-2-(4-benzocyclobutenyl)ethene (DVB-S-BCB), was synthesized from divinylbenzene (DVB) and 4-bromobenzocyclobutene (4-BrBCB) using the Heck reaction. Subsequently, P-DVB based on DVB-S-BCB was prepared by anionic polymerization. As the structure comprised thermally curable benzocyclobutene (BCB) groups and photocurable vinyl groups (UV/Thermal dual curing structure), P-DVB has been used for high-performance negative photosensitive resin with 2,6-bis(4-azidobenzylidene) cyclohexanone (BAC) as a photoinitiator. Photolithography was carried out using a 365-nm UV light source to obtain various patterns, and the research results indicate that photosensitive resins exhibit stable patterning processes at different curing stages. Besides, the cured P-DVB exhibited high thermal stability (T<sub>5%</sub> above 420 °C in N<sub>2</sub>), low dielectric constant (2.55 at 10 MHz), low dielectric loss (1.56 × 10<sup>−3</sup> at 10 MHz), and excellent mechanical performance. These properties make P-DVB a potential photoresist that can be widely used as interconnected dielectrics.</p></div>","PeriodicalId":20916,"journal":{"name":"Reactive & Functional Polymers","volume":null,"pages":null},"PeriodicalIF":4.5000,"publicationDate":"2024-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"All-hydrocarbon benzocyclobutene resin with low Dk and high-resolution photo-imageable dielectric performance\",\"authors\":\"Hanlin Du , Yueting Deng , Xingyu Hu , Juan Peng , Huan Hu , Yun Tang , Xu Ye , Jajun Ma , Junxiao Yang\",\"doi\":\"10.1016/j.reactfunctpolym.2024.105935\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Low dielectric photoinduced patterned materials have attracted extensive attention owing to their potential applications in integrated circuits and semiconductor devices. In this work, we synthesized a low dielectric polymer that can be used for photolithography. The monomer, 1-(4-vinylphenyl)-2-(4-benzocyclobutenyl)ethene (DVB-S-BCB), was synthesized from divinylbenzene (DVB) and 4-bromobenzocyclobutene (4-BrBCB) using the Heck reaction. Subsequently, P-DVB based on DVB-S-BCB was prepared by anionic polymerization. As the structure comprised thermally curable benzocyclobutene (BCB) groups and photocurable vinyl groups (UV/Thermal dual curing structure), P-DVB has been used for high-performance negative photosensitive resin with 2,6-bis(4-azidobenzylidene) cyclohexanone (BAC) as a photoinitiator. Photolithography was carried out using a 365-nm UV light source to obtain various patterns, and the research results indicate that photosensitive resins exhibit stable patterning processes at different curing stages. Besides, the cured P-DVB exhibited high thermal stability (T<sub>5%</sub> above 420 °C in N<sub>2</sub>), low dielectric constant (2.55 at 10 MHz), low dielectric loss (1.56 × 10<sup>−3</sup> at 10 MHz), and excellent mechanical performance. These properties make P-DVB a potential photoresist that can be widely used as interconnected dielectrics.</p></div>\",\"PeriodicalId\":20916,\"journal\":{\"name\":\"Reactive & Functional Polymers\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":4.5000,\"publicationDate\":\"2024-05-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Reactive & Functional Polymers\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S138151482400110X\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reactive & Functional Polymers","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S138151482400110X","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, APPLIED","Score":null,"Total":0}
All-hydrocarbon benzocyclobutene resin with low Dk and high-resolution photo-imageable dielectric performance
Low dielectric photoinduced patterned materials have attracted extensive attention owing to their potential applications in integrated circuits and semiconductor devices. In this work, we synthesized a low dielectric polymer that can be used for photolithography. The monomer, 1-(4-vinylphenyl)-2-(4-benzocyclobutenyl)ethene (DVB-S-BCB), was synthesized from divinylbenzene (DVB) and 4-bromobenzocyclobutene (4-BrBCB) using the Heck reaction. Subsequently, P-DVB based on DVB-S-BCB was prepared by anionic polymerization. As the structure comprised thermally curable benzocyclobutene (BCB) groups and photocurable vinyl groups (UV/Thermal dual curing structure), P-DVB has been used for high-performance negative photosensitive resin with 2,6-bis(4-azidobenzylidene) cyclohexanone (BAC) as a photoinitiator. Photolithography was carried out using a 365-nm UV light source to obtain various patterns, and the research results indicate that photosensitive resins exhibit stable patterning processes at different curing stages. Besides, the cured P-DVB exhibited high thermal stability (T5% above 420 °C in N2), low dielectric constant (2.55 at 10 MHz), low dielectric loss (1.56 × 10−3 at 10 MHz), and excellent mechanical performance. These properties make P-DVB a potential photoresist that can be widely used as interconnected dielectrics.
期刊介绍:
Reactive & Functional Polymers provides a forum to disseminate original ideas, concepts and developments in the science and technology of polymers with functional groups, which impart specific chemical reactivity or physical, chemical, structural, biological, and pharmacological functionality. The scope covers organic polymers, acting for instance as reagents, catalysts, templates, ion-exchangers, selective sorbents, chelating or antimicrobial agents, drug carriers, sensors, membranes, and hydrogels. This also includes reactive cross-linkable prepolymers and high-performance thermosetting polymers, natural or degradable polymers, conducting polymers, and porous polymers.
Original research articles must contain thorough molecular and material characterization data on synthesis of the above polymers in combination with their applications. Applications include but are not limited to catalysis, water or effluent treatment, separations and recovery, electronics and information storage, energy conversion, encapsulation, or adhesion.