Development of Micro/Nano Pattern Arrays with Grating-Based Periodic Structures using the Direct Laser Lithography System

Introduction: This research delves into utilizing the Direct Laser Lithography System to produce micro/nanopattern arrays with grating-based periodic structures. Initially, refining the variation in periodic structures within these arrays becomes a pivotal pursuit. This demands a deep comprehension of how structural variation aligns with specific applications, particularly in photonics and material science. Method: Advancements in hardware, software, or process optimization techniques hold potential for reaching this objective. Using an optical beam, this system enables the engraving of moderate periodic and quasi-periodic structures, enhancing pattern formation in a three-dimensional environment. Through cost-effective direct-beam interferometry systems utilizing 405 nm GaN and 290 to 780 nm AlInGaN semiconductor laser diodes, patterns ranging from in period were created, employing 300 nm gratings. Result: The system's cost-efficiency and ability to achieve high-resolution permit the creation of both regular and irregular grating designs. By employing an optical head assembly from a bluray disc recorder, housing a semiconductor laser diode and an objective lens with an NA of 0.85, this system displays promising potential in progressing the fabrication of micro/nanopattern arrays. Conclusion: Assessing their optical, mechanical, and electrical properties and exploring potential applications across varied fields like optoelectronics, photovoltaics, sensors, and biomedical devices represent critical strides for further exploration and advancement.