用于高性能 DRAM 电容器的高 K 薄膜和金属薄膜的原子层沉积:简要回顾

IF 2.4 4区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Se Eun Kim , Ju Young Sung , Yewon Yun, Byeongjun Jeon, Sang Mo Moon, Han Bin Lee, Chae Hyun Lee, Hae Jun Jung, Jae-Ung Lee, Sang Woon Lee
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引用次数: 0

摘要

在当前基于冯-诺依曼架构的计算方法中,动态随机存取存储器(DRAM)被用作核心存储器。由于数据量的增加和人工智能计算的需要,对 DRAM 的需求不断增加。DRAM 由一个晶体管和一个电容器组成。数据存储在代表 "0 "和 "1 "的电容器中。DRAM 电容器由金属-绝缘体-金属薄膜组成。在这篇综述中,我们总结了利用原子层沉积 (ALD) 工艺开发 DRAM 电容器用高 k 绝缘体和金属薄膜的实验方法。本文还探讨了针对下一代 DRAM 开发高 K 值和金属薄膜及其 ALD 工艺的未来研究方向。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review

Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review

Dynamic random-access memories (DRAMs) are used as core memories in current computing methods based on the Von Neumann architecture. The DRAM demand continuously increases because of the increased amount of data and need for artificial intelligence computing. DRAM consists of one transistor and one capacitor. Data are stored in the capacitor representing “0” and “1”. DRAM capacitors are composed of metal–insulator–metal thin films. In this review, we summarize experimental methods for development of high-k insulators and metal thin films for DRAM capacitors using the atomic layer deposition (ALD) process. Future research directions for the development of high-k and metal thin films and their ALD processes are addressed for next-generation DRAMs.

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来源期刊
Current Applied Physics
Current Applied Physics 物理-材料科学:综合
CiteScore
4.80
自引率
0.00%
发文量
213
审稿时长
33 days
期刊介绍: Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications. Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques. Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals. Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review. The Journal is owned by the Korean Physical Society.
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