脉冲阳极氧化镍钛合金表面在低电压设置下的特性变化

IF 1.6 4区 化学 Q4 CHEMISTRY, PHYSICAL
Ryota Kawakami, Yuya Matsui, Akihiro Tsuruta, Masatoshi Sakairi, Naofumi Ohtsu
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引用次数: 0

摘要

在 HNO3 中对接近等原子的镍钛合金进行脉冲阳极氧化,可形成几乎不含镍的氧化层,从而抑制镍离子从合金表面释放。核心技术包括引入较低的电压期,促进合金与电解质之间的化学反应,以获得具有更好腐蚀保护性能的表面层。在这项研究中,施加了 3.5 V 的较高电压,低电压在 0-3.5 V 范围内变化。随着低电压的升高,阳极氧化表面上的纳米级孔隙逐渐扩大,而层厚度则逐渐减小。X 射线光电子能谱分析表明,最顶层表面存在 Ni (OH)2,其浓度在电压为 1.8 V 时有所下降。较低的电压会影响最顶层表面的镍(OH)2 浓度,从而大大影响镍离子的释放行为。这些发现将有助于生产具有更好生物相容性的镍钛合金。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characteristic variations in a pulsed‐anodized NiTi alloy surface by the lower voltage setting
Pulsed anodization of a nearly equiatomic NiTi alloy in HNO3 leads to the formation of a nearly Ni‐free oxide layer, resulting in the suppression of Ni‐ion release from the alloy surface. The core technology involves introduction of a lower‐voltage period, which promostes chemical reactions between the alloy and electrolyte, to obtain a surface layer with better corrosion protection. In this study, a higher voltage of 3.5 V was applied, and the lower voltage was varied within 0–3.5 V. As the lower voltage was increased, nanometer‐sized pores present on the anodized surface gradually expanded, while the layer thickness decreased. Although the corrosion protectivity of the layer did not change significantly during the electrochemical experiments, the amount of Ni‐ion released into the physiological solution significantly decreased when the voltage was below 1.8 V. X‐ray photoelectron spectroscopy analyses revealed the presence of Ni (OH)2 on the topmost surface, and its concentration decreased at a voltage <1.8 V. Lower voltages affected the concentration of Ni (OH)2 on the topmost surface and thus considerably influenced the Ni‐ion release behavior. These findings will contribute to the production of NiTi alloys with improved biocompatibility.
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来源期刊
Surface and Interface Analysis
Surface and Interface Analysis 化学-物理化学
CiteScore
3.30
自引率
5.90%
发文量
130
审稿时长
4.4 months
期刊介绍: Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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