优化用于 365nm UV-A LED 的电注入和光萃取的 p 型触点

Yuting Li, Guangying Wang, Qinchen Lin, Shuwen Xie, Wentao Zhang, Timothy Shih, Jonathan Vigen, S. Mukhopadhyay, S. Pasayat, Chirag Gupta
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引用次数: 0

摘要

本文展示了用于 365 纳米紫外线微型 LED 的低电阻、高透明度 p 型接触材料。作为一种常用的 p 型 LED 触点,研究了快速热退火(RTA)处理前后的氧化铟锡(ITO)和氧化镍/氧化铟锡(Ni/ITO)触点。在温度超过 400°C 的 RTA 处理后,200 nm 厚的 ITO 薄膜在 365 nm 波长处的透射率从约 57% 提高到 90%,而 Ni/ITO 薄膜在退火后的透射率约为 73%。我们制造出了带有 Ni/ITO p-触点的微米级紫外发光二极管(UV-LED)。电学特性分析表明,在 600°C 下退火的 Ni/ITO 薄膜具有良好的欧姆接触性能和最高的片上外部量子效率 (EQE),尽管透光率略低。本文显示了退火镍/氧化钛薄膜作为高性能 365 nm 紫外发光二极管 p 接面材料的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimization of p-type contact for electrical injection and light extraction for 365nm UV-A LEDs
This paper demonstrates low-resistance and high-transparency p-type contact materials for UV micro-LEDs at 365 nm. As a commonly used p-type LED contact, Indium tin oxide (ITO) and nickel/indium tin oxide (Ni/ITO) contacts were studied before and after rapid thermal annealing (RTA) treatments. The transmittance at 365 nm wavelength of 200 nm thick ITO films increased from approximately 57% to 90% after RTA at a temperature exceeding 400°C, while the Ni/ITO film had a transmittance of about 73% after annealing. Micron-sized UV-LEDs (light-emitting diodes) with Ni/ITO p-contact were fabricated. Electrical characterization shows that Ni/ITO films annealed at 600°C demonstrated good ohmic contact behavior and the highest on-wafer external quantum efficiency (EQE), despite slightly lower transmittance. This paper shows the potential of annealed Ni/ITO films as promising p-contact materials for high-performance 365 nm UV-LEDs.
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