Yuting Li, Guangying Wang, Qinchen Lin, Shuwen Xie, Wentao Zhang, Timothy Shih, Jonathan Vigen, S. Mukhopadhyay, S. Pasayat, Chirag Gupta
{"title":"优化用于 365nm UV-A LED 的电注入和光萃取的 p 型触点","authors":"Yuting Li, Guangying Wang, Qinchen Lin, Shuwen Xie, Wentao Zhang, Timothy Shih, Jonathan Vigen, S. Mukhopadhyay, S. Pasayat, Chirag Gupta","doi":"10.1088/1361-6641/ad40c5","DOIUrl":null,"url":null,"abstract":"\n This paper demonstrates low-resistance and high-transparency p-type contact materials for UV micro-LEDs at 365 nm. As a commonly used p-type LED contact, Indium tin oxide (ITO) and nickel/indium tin oxide (Ni/ITO) contacts were studied before and after rapid thermal annealing (RTA) treatments. The transmittance at 365 nm wavelength of 200 nm thick ITO films increased from approximately 57% to 90% after RTA at a temperature exceeding 400°C, while the Ni/ITO film had a transmittance of about 73% after annealing. Micron-sized UV-LEDs (light-emitting diodes) with Ni/ITO p-contact were fabricated. Electrical characterization shows that Ni/ITO films annealed at 600°C demonstrated good ohmic contact behavior and the highest on-wafer external quantum efficiency (EQE), despite slightly lower transmittance. This paper shows the potential of annealed Ni/ITO films as promising p-contact materials for high-performance 365 nm UV-LEDs.","PeriodicalId":507064,"journal":{"name":"Semiconductor Science and Technology","volume":" 6","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimization of p-type contact for electrical injection and light extraction for 365nm UV-A LEDs\",\"authors\":\"Yuting Li, Guangying Wang, Qinchen Lin, Shuwen Xie, Wentao Zhang, Timothy Shih, Jonathan Vigen, S. Mukhopadhyay, S. Pasayat, Chirag Gupta\",\"doi\":\"10.1088/1361-6641/ad40c5\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n This paper demonstrates low-resistance and high-transparency p-type contact materials for UV micro-LEDs at 365 nm. As a commonly used p-type LED contact, Indium tin oxide (ITO) and nickel/indium tin oxide (Ni/ITO) contacts were studied before and after rapid thermal annealing (RTA) treatments. The transmittance at 365 nm wavelength of 200 nm thick ITO films increased from approximately 57% to 90% after RTA at a temperature exceeding 400°C, while the Ni/ITO film had a transmittance of about 73% after annealing. Micron-sized UV-LEDs (light-emitting diodes) with Ni/ITO p-contact were fabricated. Electrical characterization shows that Ni/ITO films annealed at 600°C demonstrated good ohmic contact behavior and the highest on-wafer external quantum efficiency (EQE), despite slightly lower transmittance. This paper shows the potential of annealed Ni/ITO films as promising p-contact materials for high-performance 365 nm UV-LEDs.\",\"PeriodicalId\":507064,\"journal\":{\"name\":\"Semiconductor Science and Technology\",\"volume\":\" 6\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-04-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6641/ad40c5\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6641/ad40c5","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
本文展示了用于 365 纳米紫外线微型 LED 的低电阻、高透明度 p 型接触材料。作为一种常用的 p 型 LED 触点,研究了快速热退火(RTA)处理前后的氧化铟锡(ITO)和氧化镍/氧化铟锡(Ni/ITO)触点。在温度超过 400°C 的 RTA 处理后,200 nm 厚的 ITO 薄膜在 365 nm 波长处的透射率从约 57% 提高到 90%,而 Ni/ITO 薄膜在退火后的透射率约为 73%。我们制造出了带有 Ni/ITO p-触点的微米级紫外发光二极管(UV-LED)。电学特性分析表明,在 600°C 下退火的 Ni/ITO 薄膜具有良好的欧姆接触性能和最高的片上外部量子效率 (EQE),尽管透光率略低。本文显示了退火镍/氧化钛薄膜作为高性能 365 nm 紫外发光二极管 p 接面材料的潜力。
Optimization of p-type contact for electrical injection and light extraction for 365nm UV-A LEDs
This paper demonstrates low-resistance and high-transparency p-type contact materials for UV micro-LEDs at 365 nm. As a commonly used p-type LED contact, Indium tin oxide (ITO) and nickel/indium tin oxide (Ni/ITO) contacts were studied before and after rapid thermal annealing (RTA) treatments. The transmittance at 365 nm wavelength of 200 nm thick ITO films increased from approximately 57% to 90% after RTA at a temperature exceeding 400°C, while the Ni/ITO film had a transmittance of about 73% after annealing. Micron-sized UV-LEDs (light-emitting diodes) with Ni/ITO p-contact were fabricated. Electrical characterization shows that Ni/ITO films annealed at 600°C demonstrated good ohmic contact behavior and the highest on-wafer external quantum efficiency (EQE), despite slightly lower transmittance. This paper shows the potential of annealed Ni/ITO films as promising p-contact materials for high-performance 365 nm UV-LEDs.