新型镍/铜双层阻焊层和焊料界面反应中 Kirkendall 空洞的自愈合和 IMC 生长

IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Haokun Li, Chongyang Li, Peixin Chen, Rui Xi, Feifei Li, Huiqin Ling, Ming Li
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引用次数: 0

摘要

通常在铜柱和锡基焊料之间插入单层镍作为扩散屏障,以避免金属间脆性化合物(IMC)过度生长,从而避免微凸块中出现 Kirkendall 空洞(KV)。然而,随着微凸块尺寸的缩小,镍层的厚度也随之减少,因此无法保持抑制性能。在这项工作中,在铜锡界面上采用了镍/铜双层阻挡层,通过快速生成的铜锡 IMC 阻止镍的扩散,从而减少扩散。研究了等温老化过程中的 IMC 生长行为和界面反应。在 150 °C 的老化过程中,检测到了 KVs 的自愈现象。这是由于 Cu3Sn 向 Cu6Sn5 的转变。与单层镍相比,这种新型阻挡层具有优异的抑制性能,IMC 生长速度较慢,铜基底扩散较少。此外,在 170 °C 老化测试中,镍/铜双层阻挡层在 600 小时之前没有损耗迹象,而单镍阻挡层在 144 小时后完全损耗。这种优异的抑制性能有利于超薄阻挡层在微凸块中的未来应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Self-Healing of Kirkendall Voids and IMC Growth in the Interfacial Reaction of Novel Ni/Cu bi-layer Barrier and Solder

Single Ni layer is often inserted as diffusion barrier between Cu pillar and Sn-based solder to avoid excessive growth of brittle intermetallic compounds (IMCs) and consequent Kirkendall voids (KVs) in microbumps. However, with shrinking size of microbumps, Ni layer cannot maintain the inhibition performance as its thickness is reduced as well. In this work, Ni/Cu bi-layer barrier was employed at Cu-Sn interface, which was expected to reduce diffusion by rapidly generated Cu-Sn IMC retarding the diffusion of Ni. IMC growth behavior and interfacial reaction during isothermal aging were investigated. The self-healing phenomenon of KVs was detected during aging at 150 °C . It’s attributed to the transformation from Cu3Sn to Cu6Sn5. The novel barrier exhibited excellent inhibition property compared with single Ni layer with slower IMC growth rate and less Cu substrate diffusion. Moreover, during 170 °C aging test, the Ni/Cu bi-layer barrier showed no sign of depletion until 600 h, while the single Ni barrier was completely depleted after 144 h. Such excellent inhibition property is beneficial to the future application of ultra-thin barrier layer in microbumps.

Graphical Abstract

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来源期刊
Electronic Materials Letters
Electronic Materials Letters 工程技术-材料科学:综合
CiteScore
4.70
自引率
20.80%
发文量
52
审稿时长
2.3 months
期刊介绍: Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.
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