Achievement of Green and Sustainable CVD Through Process, Equipment and Systematic Optimization in Semiconductor Fabrication

This review paper aims to outline methods and applications of green chemistry and sustainable engineering in chemical vapor deposition (CVD) for semiconductor mass production termed as green CVD. The method includes: sustainable chemical processes, efficient equipment designs and hibernation operation. Sustainable chemical process involved 40% reduction of diisopropylamino silane (DIPAS) with saturation time optimization, reduction of 20% with divert-less ALD and 60% with hybrid ALD methods. Polysilazane reduction by 29% in DRAM process via new dispense rotation mechanism. Reduction in greenhouse gases of nitrogen trifluoride (NF₃) by 27% and 25% with ramping down method and N₂ additive gas incorporation respectively. Nitrous oxide reduction of 67% ca. 23.6 kt CO₂ from year 2020 to 2022 with recipe modification. Efficient equipment design methods via systematic and safe precursor retrieval with solvent development with improved abatement and waste gas treatment. Hibernation operation system is forecasted to save up to 15% in cost due to electrical and chemical consumption reduction in collaboration with major semiconductor equipment companies.