评论-碳化硅薄膜技术：加工、性能和应用方面的最新进展：第二部分.PVD 和替代（非 PVD 和非 CVD）沉积技术

IF 1.8 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

ECS Journal of Solid State Science and Technology Pub Date : 2024-04-03 DOI:10.1149/2162-8777/ad3672

Alain E. Kaloyeros, Barry Arkles

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引用次数: 0

摘要

碳化硅 (SiCx) 薄膜沉积工艺主要分为三大类：(1) 化学气相沉积 (CVD) 及其变体，包括等离子体增强 CVD (PE-CVD)；(2) 物理气相沉积 (PVD)，包括各种形式的溅射；(3) 替代（非 CVD 和非 PVD）方法。本报告分为两部分，第一部分 ECS J. Solid State Sci. Technol.在第二部分中，我们将继续详细、系统地回顾 SiCx 薄膜前沿创新技术的最新进展，重点关注 PVD 及其他非 PVD 和非 CVD SiCx 涂层技术。我们将特别关注 PVD 和其他（非 CVD 和非 PVD）加工方法的相关实验细节，以及它们对薄膜特性和性能的影响。

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Review—Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques

Silicon carbide (SiC_x) thin films deposition processes fall primarily into three main categories: (1) chemical vapor deposition (CVD) and its variants, including plasma enhanced CVD (PE-CVD); (2) physical vapor deposition (PVD), including various forms of sputtering; (3) alternative (non-CVD and non-PVD) methodologies. Part I of this two-part report ECS J. Solid State Sci. Technol., 12, 103001 (2023) examined recent peer-reviewed publications available in the public domain pertaining to the various CVD processes for SiC_x thin films and nanostructures, as well as CVD modeling and mechanistic studies. In Part II, we continue our detailed, systematic review of the latest progress in cutting-edge SiC_x thin film innovations, focusing on PVD and other non-PVD and non-CVD SiC_x coating technologies. Particular attention is given to pertinent experimental details from PVD and alternative (non-CVD and non-PVD) processing methodologies as well as their influence on resulting film properties and performance.

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来源期刊

ECS Journal of Solid State Science and Technology MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED

CiteScore

4.50

自引率

13.60%

发文量

455

期刊介绍： The ECS Journal of Solid State Science and Technology (JSS) was launched in 2012, and publishes outstanding research covering fundamental and applied areas of solid state science and technology, including experimental and theoretical aspects of the chemistry and physics of materials and devices. JSS has five topical interest areas: carbon nanostructures and devices dielectric science and materials electronic materials and processing electronic and photonic devices and systems luminescence and display materials, devices and processing.