I Orban, S Mahmood, T Fritjof, E Lindroth, C Z Dong, J l Rui, L Y Xie, R Schuch
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引用次数: 0
摘要
报告了在斯德哥尔摩电子束离子阱中对高电荷 Si 和 S 离子的电子碰撞激发和重组率系数的测量结果。实验方法结合了探测过程中被俘获离子的光子探测,以及随后对这些离子的提取和飞行时间(TOF)电荷分析。利用 TOF 技术可以分别测量每种电荷状态的重组率系数,同时还可以测量这些离子的光子光谱和激发率系数。在本文中,我们将介绍实验过程的更多细节,并将实验结果与 Si10+-Si13+ 和 S12+-S15+ 离子的两种不同的最新重组和激发率计算结果进行比较总结。其中一个采用相对论构型相互作用方法(灵活原子代码),另一个采用相对论多体扰动理论。所研究离子的能量和共振频率与这两种方法的结果一致。
Excitation and recombination studies with silicon and sulphur ions at an EBIT
Measurements of electron-impact excitation and recombination rate coefficients of highly charged Si and S ions at the Stockholm electron beam ion trap are reported. The experimental method was a combination of photon detection from the trapped ions during probing and subsequently extraction and time-of-flight (TOF) charge analysis of these ions. The TOF technique allows to measure recombination rate coefficients separately for every charge state, and together with the photon spectra of these ions also the excitation rate coefficients. In this paper, we present more details of the experimental procedure and summarize the experimental results in comparison with two different state-of-the-art calculations of recombination and excitation rates for Si10+–Si13+ and S12+–S15+ ions. One of these uses a relativistic configuration interaction approach (flexible atomic code) and the other is a relativistic many-body perturbation theory. A good to excellent agreement with both of them is found in energy and resonance strength for the investigated ions.
期刊介绍:
Published twice-monthly (24 issues per year), Journal of Physics B: Atomic, Molecular and Optical Physics covers the study of atoms, ions, molecules and clusters, and their structure and interactions with particles, photons or fields. The journal also publishes articles dealing with those aspects of spectroscopy, quantum optics and non-linear optics, laser physics, astrophysics, plasma physics, chemical physics, optical cooling and trapping and other investigations where the objects of study are the elementary atomic, ionic or molecular properties of processes.