溅射碲化镉薄膜在生长过程中的替代氯化工艺及其在 CdS/CdTe 太阳能电池中作为激活层的应用

Abraham Israel Calderón-Martínez, Omar Jiménez-Sandoval, Francisco Rodríguez-Melgarejo, Martín Adelaido Hernández-Landaverde, Francisco Javier Flores-Ruiz, Sergio Joaquín Jiménez-Sandoval
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引用次数: 0

摘要

碲化镉是一种高效的光吸收材料,已成功应用于太阳能电池技术。这种光伏设备的效率在很大程度上取决于氯存在下的沉积后热处理。这种工艺对吸收层的好处包括消除晶粒内缺陷、增强晶粒生长和晶界钝化。吸收层氯化是最常用的关键步骤。然而,由于含 Cd 和 Cl 的蒸气和残留物的毒性,它的使用已经黯然失色。在这项工作中,使用不同氯化物的溅射靶材在碲化镉薄膜生长过程中加入了氯:CdCl2、TeCl4、BaCl2、CaCl2 或 LiCl。在对这些薄膜进行表征后,CdTe:CdCl2 和 CdTe:TeCl4 被选为可行的吸收体,用于测试它们在光伏设备中的性能。在未优化的电池中,吸收剂由两层组成:原始碲化镉和碲化镉:CdCl2 或碲化镉:TeCl4。氯化层是相邻碲化镉和硒化镉的氯源,从而在整个电池中形成均匀的氯分布。在本文使用的生长过程中激活层(DG-AL)方法中,生长过程中的氯扩散具有掺杂效应,钝化了晶界和缺陷,通过降低碲化镉功函数改善了背接触特性,并通过产生致密的氯化碲化镉层降低了针孔形成概率。本文受版权保护。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Alternative during-growth chlorination of sputtered CdTe films and their implementation as activating layers in CdS/CdTe solar cells

Cadmium telluride is an efficient light absorbing material successfully used in solar cell technology. The efficiency of such photovoltaic devices is strongly dependent on post-deposition thermal treatments in the presence of chlorine. The benefits of this process on the absorbing layer include removal of intragrain defects, grain growth enhancement, and grain boundaries passivation. The absorber chlorination is a crucial step for which CdCl2 is the most common choice. Its use, however, has been overshadowed by the toxicity of Cd- and Cl-containing vapors and residues. In this work, chlorine was incorporated in CdTe films during growth using sputtering targets with different chloride compounds: CdCl2, TeCl4, BaCl2, CaCl2, or LiCl. After characterizing these films, CdTe:CdCl2 and CdTe:TeCl4 were selected as feasible absorbers for testing their performance in photovoltaic devices. Efficiencies near 7% were obtained in as-grown unoptimized cells in which the absorber consisted of two layers: pristine CdTe and CdTe:CdCl2 or CdTe:TeCl4. The chlorinated layers acted as Cl sources for the adjacent CdTe and CdS, which produced a homogeneous distribution of chlorine throughout the cell. In the during-growth activating-layer (DG-AL) method used here, the chlorine diffusion during growth had a doping effect, passivated grain boundaries and defects, improved the back contact characteristics by reducing the CdTe work function, and lowered the pinhole formation probability by producing a compact chlorinated CdTe layer.

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