利用紫外线/二氧化钛和 H2O2 的高级氧化工艺降解三甲氧苄啶:动力学和经济方面

IF 1.3 Q3 CHEMISTRY, MULTIDISCIPLINARY
Dang Hong Minh, Nguyen Thanh Huyen, P. D. Chinh, Nguyen Thi Lan Phuong, Nguyen Thanh Dong, Nguyen Minh Tan, Nguyen Thi Thu Trang
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引用次数: 0

摘要

三甲氧苄啶(TMP)是一种有效的抗生素,可用于治疗多种不同的感染,但在药物生产、使用和人类及动物排泄过程中产生的废物会导致水污染,并造成产生抗生素耐药菌的威胁。由于其氧化能力强且无选择性,利用紫外线/二氧化钛和 H2O2 的高级氧化工艺(AOPs)比传统的废水处理方法更有效地去除它们。本研究利用 UV/TiO2 和 H2O2 的高级氧化工艺研究了不同水基质中 TMP 的降解情况。结果表明,UV/TiO2、UV/H2O2 和 UV/TiO2/H2O2 工艺在去离子水基质中降解 TMP 的表观反应速率常数分别为 0.0379、0.1937 和 0.209 min-1。医院废水中 TMP 的降解率低于湖水和去离子水。紫外/二氧化钛/H2O2 工艺降解去离子水中的 TMP 得到的主要中间产物为 C14H19O4N4(m/z:307)、C5H7ON4(m/z:139)和 C5H6O2N4(m/z:155)。最后,计算了采用光催化剂和过氧化氢的几种 AOP 处理去离子水中 TMP 的成本,UV/H2O2 为 0.88 美元/立方米,UV/TiO2 为 33.01 美元/立方米,UV/TiO2/H2O2 为 18.77 美元/立方米。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Degradation of trimethoprim by advanced oxidation process using UV/TiO2 and H2O2: Kinetic and economic aspects
Trimethoprim (TMP) is an effective antibiotic for treating many different infections, but it can lead to water pollution and pose a threat of generating antibiotic‐resistant bacteria through waste in the drug manufacturing process, use, and excretion of humans as well as animals. Due to its strong and non‐selective oxidizing ability, advanced oxidation processes (AOPs) utilizing UV/TiO2 and H2O2 are more efficient in removing them than conventional wastewater treatment. This work investigates TMP degradation in different water substrates by AOPs using UV/TiO2 and H2O2. The results show that the apparent reaction rate constant to the TMP's degradation in the de‐ion water matrix is 0.0379; 0.1937; and 0.209 min−1 for UV/TiO2, UV/H2O2, and UV/TiO2/H2O2 processes. The rate of degradation of TMP in hospital wastewater is lower than that of lake water and de‐ion water. The major intermediate products obtained from the degradation of TMP in de‐ion water by UV/TiO2/H2O2 process were recognized as C14H19O4N4 (m/z: 307), C5H7ON4 (m/z: 139), and C5H6O2N4 (m/z: 155). Finally, the cost of TMP treatment in de‐ion water by several AOPs using photocatalyst and hydrogen peroxide was calculated, it is 0.88 $/m3 for UV/H2O2; 33.01 $/m3 for UV/TiO2 process, and 18.77 $/m3 for UV/TiO2/H2O2 process.
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来源期刊
Vietnam Journal of Chemistry
Vietnam Journal of Chemistry CHEMISTRY, MULTIDISCIPLINARY-
CiteScore
1.70
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