小角 X 射线散射和超小角 X 射线散射中窗口二次散射贡献的修正程序

IF 6.1 3区材料科学 Q1 Biochemistry, Genetics and Molecular Biology

Journal of Applied Crystallography Pub Date : 2024-03-29 DOI:10.1107/s1600576724001997

William Chèvremont, Theyencheri Narayanan

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引用次数: 0

摘要

本文介绍了一种校正程序，用于消除测量到的小角度 X 射线散射图案的间接背景贡献。样品在超小角区域的高散射能力可作为放置在探测器前的窗口的二次源。由此产生的二次散射在测量图案中显示为无法直接减去的样品相关背景。这是在超低角度测量中的一个复杂问题，会大大降低检测的有用动态范围。本文介绍了两种不同的程序来获取样品的真实散射曲线。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

A correction procedure for secondary scattering contributions from windows in small-angle X-ray scattering and ultra-small-angle X-ray scattering

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A correction procedure for secondary scattering contributions from windows in small-angle X-ray scattering and ultra-small-angle X-ray scattering

This article describes a correction procedure for the removal of indirect background contributions to measured small-angle X-ray scattering patterns. The high scattering power of a sample in the ultra-small-angle region may serve as a secondary source for a window placed in front of the detector. The resulting secondary scattering appears as a sample-dependent background in the measured pattern that cannot be directly subtracted. This is an intricate problem in measurements at ultra-low angles, which can significantly reduce the useful dynamic range of detection. Two different procedures are presented to retrieve the real scattering profile of the sample.

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来源期刊

Journal of Applied Crystallography 化学-晶体学

CiteScore

10.00

自引率

3.30%

发文量

178

审稿时长

4.7 months

期刊介绍： Many research topics in condensed matter research, materials science and the life sciences make use of crystallographic methods to study crystalline and non-crystalline matter with neutrons, X-rays and electrons. Articles published in the Journal of Applied Crystallography focus on these methods and their use in identifying structural and diffusion-controlled phase transformations, structure-property relationships, structural changes of defects, interfaces and surfaces, etc. Developments of instrumentation and crystallographic apparatus, theory and interpretation, numerical analysis and other related subjects are also covered. The journal is the primary place where crystallographic computer program information is published.