氧化铜薄膜厚度对石墨/氧化铜/镍太阳能电池效率影响的模拟和数值建模

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Serhii I. Kuryshchuk, Galyna O. Andrushchak, Taras T. Kovaliuk, Andriy I. Mostovyi, Hryhorii P. Parkhomenko, Sanjay H. Sahare, Mykhailo M. Solovan, Viktor V. Brus
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引用次数: 0

摘要

氧化铜是 19 世纪初太阳能电池的原始半导体材料之一,在硅太阳能电池因其丰富的可获得性和环保特性而流行起来之前,氧化铜就已被用于太阳能电池。其光电参数表明它在太阳能电池器件中具有巨大的潜力,尽管与理论预测的性能相差甚远,但通过形成不同的异质结,为提高太阳能电池的性能提供了巨大的空间。在这项研究中,我们利用一种由玻璃/ITO/石墨/氧化铜/镍组成的新结构,从理论上研究了氧化铜(CuO)作为薄膜太阳能电池活性层的潜力。此外,通过使用相当于 AM1.5 光谱的归一化光强,确定了不同活性层厚度下的电荷载流子产生率和光伏器件效率的理论阈值。考虑到太阳能电池的实际光学参数,500 nm CuO 薄膜的模拟结构优化性能为 24%。所做的理论工作有助于采用氧化铜并提高太阳能电池的实验性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simulation and numerical modeling of CuO films thickness influence on the efficiency of graphite/CuO/Ni solar cells

Copper oxide is one of the original semiconductor materials employed for solar cells in the early 19th century before Silicon solar cells became popular due to their abundant availability, and eco-friendly nature. The optoelectronic parameters signify its huge potential in solar cell devices, though it's far from the theoretically predicted performance, provides tremendous scope to improve the solar cell performance by forming different heterojunctions. In this study, we investigated the copper oxide's (CuO) potential as an active layer in thin-film solar cells theoretically with a new structure consisting of a Glass/ITO/Graphite/CuO/Ni. Furthermore, the charge carrier's generation rate and theoretical thresholds for photovoltaic device efficiency were determined for varying active layer thicknesses by employing a normalized light intensity equivalent to that of the AM1.5 spectrum. The optimized performance of the simulated structure by considering realistic optical parameters of the solar cell was ~24%, obtained for the 500 nm CuO films. The performed theoretical work can help to employ CuO and boost the performance of solar cells experimentally.

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来源期刊
CiteScore
4.60
自引率
6.20%
发文量
101
审稿时长
>12 weeks
期刊介绍: Prediction through modelling forms the basis of engineering design. The computational power at the fingertips of the professional engineer is increasing enormously and techniques for computer simulation are changing rapidly. Engineers need models which relate to their design area and which are adaptable to new design concepts. They also need efficient and friendly ways of presenting, viewing and transmitting the data associated with their models. The International Journal of Numerical Modelling: Electronic Networks, Devices and Fields provides a communication vehicle for numerical modelling methods and data preparation methods associated with electrical and electronic circuits and fields. It concentrates on numerical modelling rather than abstract numerical mathematics. Contributions on numerical modelling will cover the entire subject of electrical and electronic engineering. They will range from electrical distribution networks to integrated circuits on VLSI design, and from static electric and magnetic fields through microwaves to optical design. They will also include the use of electrical networks as a modelling medium.
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