溅射参数和掺杂对氮化铬涂层性能的影响--重要综述

IF 1.6 4区化学 Q4 CHEMISTRY, PHYSICAL

Surface and Interface Analysis Pub Date : 2024-03-28 DOI:10.1002/sia.7306

Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Devesh Kumar Avasthi, Piyush Chandra Verma, Amit Kumar Chawla

{"title":"溅射参数和掺杂对氮化铬涂层性能的影响--重要综述","authors":"Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Devesh Kumar Avasthi, Piyush Chandra Verma, Amit Kumar Chawla","doi":"10.1002/sia.7306","DOIUrl":null,"url":null,"abstract":"Chromium‐based coatings have been of interest to researchers for the last two decades because of their extraordinary properties like high hardness, high wear, and corrosion resistance properties. However, it is in practice and research to increase the properties of Cr‐based coatings for high‐temperature applications. Numerous dopants like silicon (Si), titanium (Ti), vanadium (V), aluminum (Al), and zirconium (Zr) have been used together with Cr to achieve enhanced properties. The plasma‐based sputtering process is one of the popular and reliable techniques to deposit thin film coatings. The substrate material, processed gas and pressure, substrate temperature, film thickness, and so on also play a significant role in varying the properties and microstructure of the deposited film. Several researchers have deposited Cr/CrN‐based thin films via the chemical vapor deposition technique (CVD) and physical vapor deposition technique (PVD) to study their properties and behavior at room temperature as well as for high‐temperature applications. This work reflects the review of work done to deposit Cr/CrN‐based coatings deposited via PVD: more specifically sputtering technique. The effect of doping in the CrN matrix and variation in sputtering parameters on the properties of CrN‐based coatings have also been studied.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"45 1","pages":""},"PeriodicalIF":1.6000,"publicationDate":"2024-03-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical review\",\"authors\":\"Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Devesh Kumar Avasthi, Piyush Chandra Verma, Amit Kumar Chawla\",\"doi\":\"10.1002/sia.7306\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Chromium‐based coatings have been of interest to researchers for the last two decades because of their extraordinary properties like high hardness, high wear, and corrosion resistance properties. However, it is in practice and research to increase the properties of Cr‐based coatings for high‐temperature applications. Numerous dopants like silicon (Si), titanium (Ti), vanadium (V), aluminum (Al), and zirconium (Zr) have been used together with Cr to achieve enhanced properties. The plasma‐based sputtering process is one of the popular and reliable techniques to deposit thin film coatings. The substrate material, processed gas and pressure, substrate temperature, film thickness, and so on also play a significant role in varying the properties and microstructure of the deposited film. Several researchers have deposited Cr/CrN‐based thin films via the chemical vapor deposition technique (CVD) and physical vapor deposition technique (PVD) to study their properties and behavior at room temperature as well as for high‐temperature applications. This work reflects the review of work done to deposit Cr/CrN‐based coatings deposited via PVD: more specifically sputtering technique. The effect of doping in the CrN matrix and variation in sputtering parameters on the properties of CrN‐based coatings have also been studied.\",\"PeriodicalId\":22062,\"journal\":{\"name\":\"Surface and Interface Analysis\",\"volume\":\"45 1\",\"pages\":\"\"},\"PeriodicalIF\":1.6000,\"publicationDate\":\"2024-03-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface and Interface Analysis\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://doi.org/10.1002/sia.7306\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface and Interface Analysis","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1002/sia.7306","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}

引用次数: 0

摘要

过去二十年来，铬基涂层因其高硬度、高耐磨性和耐腐蚀性等非凡特性一直备受研究人员关注。然而，如何提高铬基涂层在高温应用中的性能一直是实践和研究的课题。许多掺杂剂，如硅（Si）、钛（Ti）、钒（V）、铝（Al）和锆（Zr）已与铬一起使用，以达到增强性能的目的。等离子体溅射工艺是沉积薄膜涂层的常用可靠技术之一。基底材料、处理气体和压力、基底温度、薄膜厚度等对沉积薄膜的性能和微观结构的变化也起着重要作用。一些研究人员通过化学气相沉积技术（CVD）和物理气相沉积技术（PVD）沉积了以 Cr/CrN 为基材的薄膜，以研究它们在室温和高温应用下的特性和行为。这项研究回顾了通过 PVD（更具体地说是溅射技术）沉积以 Cr/CrN 为基础的涂层的工作。此外，还研究了在 CrN 基体中的掺杂以及溅射参数的变化对 CrN 基涂层性能的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical review

Chromium‐based coatings have been of interest to researchers for the last two decades because of their extraordinary properties like high hardness, high wear, and corrosion resistance properties. However, it is in practice and research to increase the properties of Cr‐based coatings for high‐temperature applications. Numerous dopants like silicon (Si), titanium (Ti), vanadium (V), aluminum (Al), and zirconium (Zr) have been used together with Cr to achieve enhanced properties. The plasma‐based sputtering process is one of the popular and reliable techniques to deposit thin film coatings. The substrate material, processed gas and pressure, substrate temperature, film thickness, and so on also play a significant role in varying the properties and microstructure of the deposited film. Several researchers have deposited Cr/CrN‐based thin films via the chemical vapor deposition technique (CVD) and physical vapor deposition technique (PVD) to study their properties and behavior at room temperature as well as for high‐temperature applications. This work reflects the review of work done to deposit Cr/CrN‐based coatings deposited via PVD: more specifically sputtering technique. The effect of doping in the CrN matrix and variation in sputtering parameters on the properties of CrN‐based coatings have also been studied.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Surface and Interface Analysis 化学-物理化学

CiteScore

3.30

自引率

5.90%

发文量

130

审稿时长

4.4 months

期刊介绍： Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).