基于常压冷等离子体的 Ti3C2Tx 表面官能团调控

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Weisheng Cui, Shuxiao Chen, Jialu Duan, Ruobing Zhang
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引用次数: 0

摘要

对 Ti3C2Tx 表面特性的调控对其在各个领域的多样化应用起着至关重要的作用。然而,控制其表面官能团的直接而可靠的技术仍未问世。在这项研究中,我们利用常压冷等离子体实现了对 Ti3C2Tx 表面官能团的可控改性。我们评估了等离子体的生成特性,发现气体参数会影响放电功率,并导致相同电压下的气体温度不同。光谱分析证实了等离子体中存在大量活性物种,促进了 Ti3C2Tx 表面官能团化学键的断裂和重组。等离子体射流与 Ti3C2Tx 薄膜之间的相互作用表明,Ti3C2Tx 薄膜的半导体特性限制了等离子体的扩散面积,而 N2 掺杂和气体流速的增加分别缩小和扩大了冷等离子体的覆盖面积。短短一分钟的冷等离子体处理对 Ti3C2Tx 薄膜表面产生了轻微的蚀刻效应,有效地改变了 -O 和 -F 官能团。但值得注意的是,在空气中进行过多的冷等离子处理可能会导致 Ti3C2Tx 部分氧化,因此在进一步应用中必须使用定制的气体环境。这项研究为 Ti3C2Tx 的表面改性技术提供了宝贵的见解,具有广泛的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface functional group regulation of Ti3C2Tx based on atmospheric pressure cold plasma

The modulation of surface properties of Ti3C2Tx plays a crucial role in its diverse applications across various fields. However, a straightforward and reliable technique for controlling its surface functional groups remains elusive. In this study, we achieved controlled modification of Ti3C2Tx surface functional groups using atmospheric-pressure cold plasma. We evaluated the plasma generation characteristics and found that the gas parameters could influence the discharge power and lead to different gas temperatures with the same voltage. Spectral analysis confirmed the presence of numerous reactive species in the plasma, facilitating the breaking and recombination of chemical bonds of functional groups on the Ti3C2Tx surface. The interaction between the plasma jet and Ti3C2Tx film revealed that the semiconductor properties of the Ti3C2Tx film limit the plasma diffusion area, while N2 doping and increased gas flow rates respectively reduce and enlarge the coverage area of cold plasma. A brief one-minute cold plasma treatment induced a slight etching effect on the Ti3C2Tx film surface, effectively altering the -O and -F functional groups. However, it is noteworthy that excessive cold plasma treatment in the air may result in partial oxidation of Ti3C2Tx, necessitating the use of custom gas environments in further applications. This research provides valuable insights into surface modification techniques for Ti3C2Tx with potential implications in a wide range of applications.

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来源期刊
Contributions to Plasma Physics
Contributions to Plasma Physics 物理-物理:流体与等离子体
CiteScore
2.90
自引率
12.50%
发文量
110
审稿时长
4-8 weeks
期刊介绍: Aims and Scope of Contributions to Plasma Physics: Basic physics of low-temperature plasmas; Strongly correlated non-ideal plasmas; Dusty Plasmas; Plasma discharges - microplasmas, reactive, and atmospheric pressure plasmas; Plasma diagnostics; Plasma-surface interaction; Plasma technology; Plasma medicine.
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