用于疏水涂层的二氧化硅纳米颗粒功能化工艺研究

IF 1.6 4区化学 Q4 CHEMISTRY, PHYSICAL

Surface and Interface Analysis Pub Date : 2024-03-10 DOI:10.1002/sia.7305

Avinash Kumar, Sushant Negi, Simanchal Kar

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引用次数: 0

摘要

功能化纳米二氧化硅是一种无机化合物，在通过化学反应加入硅烷基团后会表现出疏水特性。这种特性对于玻璃、金属和陶瓷等各种基材的表面改性非常有效。这些表面改性可应用于自清洁、防雾涂层和憎水材料。在这项研究中，采用溶胶-凝胶法成功合成了纳米二氧化硅和十六烷基三甲氧基硅烷（HDTMS）功能化纳米二氧化硅，并将其应用于涂层。水接触角（WCA）分析、傅立叶变换红外光谱（FTIR）、热重分析（TGA）、扫描电子显微镜（SEM）和透射电子显微镜（TEM）观察结果表明，HDTMS 的疏水长链烷基成功接枝到了 SiO2 纳米粒子表面。值得注意的是，当 SiO2 纳米粒子与 HDTMS 的比例为 0.25:1 时，功能化 SiO2 纳米粒子的 WCA 显著提高。该值是改性前初始接触角的 5.35 倍，从而实现了超疏水特性。

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A study on functionalization process of silicon dioxide nanoparticles for hydrophobic coating applications

Functionalized nano-SiO₂ is an inorganic compound that exhibits hydrophobic properties upon the addition of a silane group through a chemical reaction. This property is highly effective in surface modification for various substrates, including glass, metal, and ceramics. These surface modifications find applications in self-cleaning, anti-fogging coatings, and water-repellent materials. In this work, the role of nano-SiO₂ and Hexadecyltrimethoxysilane (HDTMS) functionalized nano-SiO₂ has been synthesized successfully by the sol–gel method for coating applications. The outcomes of water contact angle (WCA), analysis, Fourier transform infrared spectroscopy (FTIR), thermal gravimetric analysis (TGA), scanning electron microscope (SEM), and transmission electron microscope (TEM) observations revealed the successful grafting of hydrophobic long-chain alkyl groups from HDTMS onto the surface of SiO₂ nanoparticles. Notably, when the ratio of SiO₂ nanoparticles to HDTMS is 0.25:1, the WCA of the functionalized SiO₂ nanoparticles is enhanced significantly. This value is 5.35 times greater than the initial angle of contact before the modification, leading to the achievement of a super hydrophobic property.

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来源期刊

Surface and Interface Analysis 化学-物理化学

CiteScore

3.30

自引率

5.90%

发文量

130

审稿时长

4.4 months

期刊介绍： Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).