{"title":"通过硅取向优化消除基于 LiNbO$_{3}$/SiO$_{2}$/poly-Si/Si 衬底的声表面波谐振器的高阶模式","authors":"Huiping Xu;Sulei Fu;Rongxuan Su;Peisen Liu;Boyuan Xiao;Shuai Zhang;Rui Wang;Cheng Song;Fei Zeng;Weibiao Wang;Feng Pan","doi":"10.1109/JMEMS.2024.3369639","DOIUrl":null,"url":null,"abstract":"Lithium-niobate-on-insulator (LNOI) platform has emerged as a promising solution for fabricating wideband and low-loss surface acoustic wave (SAW) filters. However, it simultaneously excites higher order modes, causing out-of-band (OoB) spurious responses. In this work, the elimination condition for higher order modes in LiNbO3 (LN)/SiO2/poly-Si/Si structure was summarized from analyzing the coupling mechanism between the velocities of shear bulk acoustic waves (\n<inline-formula> <tex-math>$V_{\\mathrm {S}}$ </tex-math></inline-formula>\n) of Si and that of higher order mode (\n<inline-formula> <tex-math>$V_{\\mathrm {p-h}}$ </tex-math></inline-formula>\n). According to the elimination condition of \n<inline-formula> <tex-math>$V_{\\mathrm {p-h}}$ </tex-math></inline-formula>\n exceeding \n<inline-formula> <tex-math>$V_{\\mathrm {S}}$ </tex-math></inline-formula>\n, meticulously selecting the crystal plane and propagation angle \n<inline-formula> <tex-math>$\\alpha $ </tex-math></inline-formula>\n of Si to obtain desired \n<inline-formula> <tex-math>$V_{\\mathrm {S}}$ </tex-math></inline-formula>\n is necessary. First, the resonators built on \n<inline-formula> <tex-math>$32^{\\circ }Y$ </tex-math></inline-formula>\n-\n<inline-formula> <tex-math>$X$ </tex-math></inline-formula>\n LN/SiO2/poly-Si/Si platforms with typical Si (100), Si (110) and Si (111) substrates were studied by simulation, which reveals that Si (110) manifests the optimal suppression capacity with \n<inline-formula> <tex-math>$\\alpha _{110}$ </tex-math></inline-formula>\n window of \n<inline-formula> <tex-math>$18^{\\circ }-60^{\\circ }$ </tex-math></inline-formula>\n, followed by the Si (111) plane of \n<inline-formula> <tex-math>$\\alpha _{111}= 14^{\\circ }-36^{\\circ }$ </tex-math></inline-formula>\n. Si (100) substrate can hardly suppress higher order modes. Furthermore, resonators were designed and prepared on the above three Si planes. In coherence with the theoretical prediction, the resonators built on Si (135°, 90°, 45°) substrate can effectively eliminate the OoB ripples, while the resonators based on Si (0°, 0°, 45°) and Si (135°, 54.74°, 60°) substrates both excite the higher order modes, whose maximum admittance ratios (AR\n<inline-formula> <tex-math>$_{\\mathrm {h}}$ </tex-math></inline-formula>\n) are 15.0 dB and 19.9 dB, respectively. This work demonstrates a valid methodology for constructing spurious-free filters meeting 5G requirements. [2023-0212]","PeriodicalId":16621,"journal":{"name":"Journal of Microelectromechanical Systems","volume":"33 2","pages":"163-173"},"PeriodicalIF":2.5000,"publicationDate":"2024-03-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Higher Order Mode Elimination for SAW Resonators Based on LiNbO₃/SiO₂/poly-Si/Si Substrate by Si Orientation Optimization\",\"authors\":\"Huiping Xu;Sulei Fu;Rongxuan Su;Peisen Liu;Boyuan Xiao;Shuai Zhang;Rui Wang;Cheng Song;Fei Zeng;Weibiao Wang;Feng Pan\",\"doi\":\"10.1109/JMEMS.2024.3369639\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Lithium-niobate-on-insulator (LNOI) platform has emerged as a promising solution for fabricating wideband and low-loss surface acoustic wave (SAW) filters. However, it simultaneously excites higher order modes, causing out-of-band (OoB) spurious responses. In this work, the elimination condition for higher order modes in LiNbO3 (LN)/SiO2/poly-Si/Si structure was summarized from analyzing the coupling mechanism between the velocities of shear bulk acoustic waves (\\n<inline-formula> <tex-math>$V_{\\\\mathrm {S}}$ </tex-math></inline-formula>\\n) of Si and that of higher order mode (\\n<inline-formula> <tex-math>$V_{\\\\mathrm {p-h}}$ </tex-math></inline-formula>\\n). According to the elimination condition of \\n<inline-formula> <tex-math>$V_{\\\\mathrm {p-h}}$ </tex-math></inline-formula>\\n exceeding \\n<inline-formula> <tex-math>$V_{\\\\mathrm {S}}$ </tex-math></inline-formula>\\n, meticulously selecting the crystal plane and propagation angle \\n<inline-formula> <tex-math>$\\\\alpha $ </tex-math></inline-formula>\\n of Si to obtain desired \\n<inline-formula> <tex-math>$V_{\\\\mathrm {S}}$ </tex-math></inline-formula>\\n is necessary. First, the resonators built on \\n<inline-formula> <tex-math>$32^{\\\\circ }Y$ </tex-math></inline-formula>\\n-\\n<inline-formula> <tex-math>$X$ </tex-math></inline-formula>\\n LN/SiO2/poly-Si/Si platforms with typical Si (100), Si (110) and Si (111) substrates were studied by simulation, which reveals that Si (110) manifests the optimal suppression capacity with \\n<inline-formula> <tex-math>$\\\\alpha _{110}$ </tex-math></inline-formula>\\n window of \\n<inline-formula> <tex-math>$18^{\\\\circ }-60^{\\\\circ }$ </tex-math></inline-formula>\\n, followed by the Si (111) plane of \\n<inline-formula> <tex-math>$\\\\alpha _{111}= 14^{\\\\circ }-36^{\\\\circ }$ </tex-math></inline-formula>\\n. Si (100) substrate can hardly suppress higher order modes. Furthermore, resonators were designed and prepared on the above three Si planes. In coherence with the theoretical prediction, the resonators built on Si (135°, 90°, 45°) substrate can effectively eliminate the OoB ripples, while the resonators based on Si (0°, 0°, 45°) and Si (135°, 54.74°, 60°) substrates both excite the higher order modes, whose maximum admittance ratios (AR\\n<inline-formula> <tex-math>$_{\\\\mathrm {h}}$ </tex-math></inline-formula>\\n) are 15.0 dB and 19.9 dB, respectively. This work demonstrates a valid methodology for constructing spurious-free filters meeting 5G requirements. [2023-0212]\",\"PeriodicalId\":16621,\"journal\":{\"name\":\"Journal of Microelectromechanical Systems\",\"volume\":\"33 2\",\"pages\":\"163-173\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2024-03-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Microelectromechanical Systems\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10460323/\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Microelectromechanical Systems","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10460323/","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Higher Order Mode Elimination for SAW Resonators Based on LiNbO₃/SiO₂/poly-Si/Si Substrate by Si Orientation Optimization
Lithium-niobate-on-insulator (LNOI) platform has emerged as a promising solution for fabricating wideband and low-loss surface acoustic wave (SAW) filters. However, it simultaneously excites higher order modes, causing out-of-band (OoB) spurious responses. In this work, the elimination condition for higher order modes in LiNbO3 (LN)/SiO2/poly-Si/Si structure was summarized from analyzing the coupling mechanism between the velocities of shear bulk acoustic waves (
$V_{\mathrm {S}}$
) of Si and that of higher order mode (
$V_{\mathrm {p-h}}$
). According to the elimination condition of
$V_{\mathrm {p-h}}$
exceeding
$V_{\mathrm {S}}$
, meticulously selecting the crystal plane and propagation angle
$\alpha $
of Si to obtain desired
$V_{\mathrm {S}}$
is necessary. First, the resonators built on
$32^{\circ }Y$
-
$X$
LN/SiO2/poly-Si/Si platforms with typical Si (100), Si (110) and Si (111) substrates were studied by simulation, which reveals that Si (110) manifests the optimal suppression capacity with
$\alpha _{110}$
window of
$18^{\circ }-60^{\circ }$
, followed by the Si (111) plane of
$\alpha _{111}= 14^{\circ }-36^{\circ }$
. Si (100) substrate can hardly suppress higher order modes. Furthermore, resonators were designed and prepared on the above three Si planes. In coherence with the theoretical prediction, the resonators built on Si (135°, 90°, 45°) substrate can effectively eliminate the OoB ripples, while the resonators based on Si (0°, 0°, 45°) and Si (135°, 54.74°, 60°) substrates both excite the higher order modes, whose maximum admittance ratios (AR
$_{\mathrm {h}}$
) are 15.0 dB and 19.9 dB, respectively. This work demonstrates a valid methodology for constructing spurious-free filters meeting 5G requirements. [2023-0212]
期刊介绍:
The topics of interest include, but are not limited to: devices ranging in size from microns to millimeters, IC-compatible fabrication techniques, other fabrication techniques, measurement of micro phenomena, theoretical results, new materials and designs, micro actuators, micro robots, micro batteries, bearings, wear, reliability, electrical interconnections, micro telemanipulation, and standards appropriate to MEMS. Application examples and application oriented devices in fluidics, optics, bio-medical engineering, etc., are also of central interest.