Kyu Hyun Han, Seung-Geun Kim, Seung-Hwan Kim, Jong-Hyun Kim, Seong-Hyun Hwang, Min-Su Kim, Sung-Joo Song, Hyun-Yong Yu
{"title":"使用氨基硅烷偶联剂进行介电界面工程,以增强负差分电阻现象","authors":"Kyu Hyun Han, Seung-Geun Kim, Seung-Hwan Kim, Jong-Hyun Kim, Seong-Hyun Hwang, Min-Su Kim, Sung-Joo Song, Hyun-Yong Yu","doi":"10.1016/j.mtadv.2024.100475","DOIUrl":null,"url":null,"abstract":"Negative differential resistance (NDR) devices have recently attracted interest as multi-valued logic (MVL) circuits, owing to their folded electrical characteristics. However, with necessity of sophisticated computing systems, advanced NDR devices are required for stable low-power-consumption MVL circuits. Here, we developed van der Waals (vdW) NDR device with high peak-to-valley current ratio (PVCR) and low peak voltage (V), utilizing the passivation and doping effects of APTES layer as aminosilane coupling agent, at dielectric interface. The PVCR of NDR device reached 10 through reduced interface trap owing to the passivation effect of APTES silane group. Additionally, low V of NDR device was achieved at 0.2 V through doping effect of the APTES amine group. These PVCR and V values indicate the one of the best vdW NDR performance. Furthermore, stable logic state and low operation voltage of the ternary inverter were implemented using NDR device with high PVCR and low V. This NDR device represents a significant advancement for next-generation MVL technologies.","PeriodicalId":48495,"journal":{"name":"Materials Today Advances","volume":"66 1","pages":""},"PeriodicalIF":8.1000,"publicationDate":"2024-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Dielectric interface engineering using aminosilane coupling agent for enhancement of negative differential resistance phenomenon\",\"authors\":\"Kyu Hyun Han, Seung-Geun Kim, Seung-Hwan Kim, Jong-Hyun Kim, Seong-Hyun Hwang, Min-Su Kim, Sung-Joo Song, Hyun-Yong Yu\",\"doi\":\"10.1016/j.mtadv.2024.100475\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Negative differential resistance (NDR) devices have recently attracted interest as multi-valued logic (MVL) circuits, owing to their folded electrical characteristics. However, with necessity of sophisticated computing systems, advanced NDR devices are required for stable low-power-consumption MVL circuits. Here, we developed van der Waals (vdW) NDR device with high peak-to-valley current ratio (PVCR) and low peak voltage (V), utilizing the passivation and doping effects of APTES layer as aminosilane coupling agent, at dielectric interface. The PVCR of NDR device reached 10 through reduced interface trap owing to the passivation effect of APTES silane group. Additionally, low V of NDR device was achieved at 0.2 V through doping effect of the APTES amine group. These PVCR and V values indicate the one of the best vdW NDR performance. Furthermore, stable logic state and low operation voltage of the ternary inverter were implemented using NDR device with high PVCR and low V. This NDR device represents a significant advancement for next-generation MVL technologies.\",\"PeriodicalId\":48495,\"journal\":{\"name\":\"Materials Today Advances\",\"volume\":\"66 1\",\"pages\":\"\"},\"PeriodicalIF\":8.1000,\"publicationDate\":\"2024-02-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Today Advances\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1016/j.mtadv.2024.100475\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Today Advances","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.mtadv.2024.100475","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Dielectric interface engineering using aminosilane coupling agent for enhancement of negative differential resistance phenomenon
Negative differential resistance (NDR) devices have recently attracted interest as multi-valued logic (MVL) circuits, owing to their folded electrical characteristics. However, with necessity of sophisticated computing systems, advanced NDR devices are required for stable low-power-consumption MVL circuits. Here, we developed van der Waals (vdW) NDR device with high peak-to-valley current ratio (PVCR) and low peak voltage (V), utilizing the passivation and doping effects of APTES layer as aminosilane coupling agent, at dielectric interface. The PVCR of NDR device reached 10 through reduced interface trap owing to the passivation effect of APTES silane group. Additionally, low V of NDR device was achieved at 0.2 V through doping effect of the APTES amine group. These PVCR and V values indicate the one of the best vdW NDR performance. Furthermore, stable logic state and low operation voltage of the ternary inverter were implemented using NDR device with high PVCR and low V. This NDR device represents a significant advancement for next-generation MVL technologies.
期刊介绍:
Materials Today Advances is a multi-disciplinary, open access journal that aims to connect different communities within materials science. It covers all aspects of materials science and related disciplines, including fundamental and applied research. The focus is on studies with broad impact that can cross traditional subject boundaries. The journal welcomes the submissions of articles at the forefront of materials science, advancing the field. It is part of the Materials Today family and offers authors rigorous peer review, rapid decisions, and high visibility.