使用氨基硅烷偶联剂进行介电界面工程,以增强负差分电阻现象

IF 8.1 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Kyu Hyun Han, Seung-Geun Kim, Seung-Hwan Kim, Jong-Hyun Kim, Seong-Hyun Hwang, Min-Su Kim, Sung-Joo Song, Hyun-Yong Yu
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引用次数: 0

摘要

负差分电阻(NDR)器件因其折叠式电气特性,最近作为多值逻辑(MVL)电路引起了人们的兴趣。然而,随着复杂计算系统的需要,需要先进的负差分电阻器件来实现稳定的低功耗 MVL 电路。在这里,我们开发出了具有高峰谷电流比(PVCR)和低峰值电压(V)的范德华(vdW)NDR 器件,利用了作为氨基硅烷耦合剂的 APTES 层在介电界面上的钝化和掺杂效应。由于 APTES 硅烷基团的钝化效应,减少了界面陷阱,NDR 器件的 PVCR 达到了 10。此外,通过 APTES 氨基的掺杂效应,NDR 器件的低 V 值达到了 0.2 V。这些 PVCR 值和 V 值表明,该器件是 vdW 性能最好的 NDR 器件之一。此外,利用高 PVCR 和低 V 值的 NDR 器件实现了三元逆变器的稳定逻辑状态和低工作电压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dielectric interface engineering using aminosilane coupling agent for enhancement of negative differential resistance phenomenon
Negative differential resistance (NDR) devices have recently attracted interest as multi-valued logic (MVL) circuits, owing to their folded electrical characteristics. However, with necessity of sophisticated computing systems, advanced NDR devices are required for stable low-power-consumption MVL circuits. Here, we developed van der Waals (vdW) NDR device with high peak-to-valley current ratio (PVCR) and low peak voltage (V), utilizing the passivation and doping effects of APTES layer as aminosilane coupling agent, at dielectric interface. The PVCR of NDR device reached 10 through reduced interface trap owing to the passivation effect of APTES silane group. Additionally, low V of NDR device was achieved at 0.2 V through doping effect of the APTES amine group. These PVCR and V values indicate the one of the best vdW NDR performance. Furthermore, stable logic state and low operation voltage of the ternary inverter were implemented using NDR device with high PVCR and low V. This NDR device represents a significant advancement for next-generation MVL technologies.
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来源期刊
Materials Today Advances
Materials Today Advances MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
14.30
自引率
2.00%
发文量
116
审稿时长
32 days
期刊介绍: Materials Today Advances is a multi-disciplinary, open access journal that aims to connect different communities within materials science. It covers all aspects of materials science and related disciplines, including fundamental and applied research. The focus is on studies with broad impact that can cross traditional subject boundaries. The journal welcomes the submissions of articles at the forefront of materials science, advancing the field. It is part of the Materials Today family and offers authors rigorous peer review, rapid decisions, and high visibility.
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