Yuma Sugai, Hironori Sugata, Takuya Sugawara, Safdar Muhammad, Jani Hämäläinen, Nina Lamminmäki, Juhana Kostamo
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引用次数: 0
摘要
研究了利用原子层沉积 (ALD) 技术沉积的氟化镁 (MgF2) 薄膜在光学镀膜、元表面抗反射层和化学电阻钝化方面的应用。沉积在市售的 Picosun® R-200 高级 ALD 反应器中进行。对薄膜的成分、密度、光学特性、化学电阻率和覆盖率进行了表征。ALD 沉积薄膜在波长低至 350 纳米时具有高 R + T 值、出色的 3D 覆盖率和高化学电阻率。这项技术具有独特的性能,可改善三维结构光学,如超表面。
Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition
Magnesium fluoride (MgF2) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings, meta-surface anti-reflection layer, and chemically resistive passivation. The deposition was performed in a commercially available Picosun® R-200 Advanced ALD reactor. Characterization of composition, density, optical property, chemical resistivity and coverage were performed. ALD-deposited films showed high R + T at wavelength down to 350 nm, excellent 3D coverage, and high chemical resistivity. This technology enables unique properties to improve 3D structured optics such as metasurface.
期刊介绍:
Optical Review is an international journal published by the Optical Society of Japan. The scope of the journal is:
General and physical optics;
Quantum optics and spectroscopy;
Information optics;
Photonics and optoelectronics;
Biomedical photonics and biological optics;
Lasers;
Nonlinear optics;
Optical systems and technologies;
Optical materials and manufacturing technologies;
Vision;
Infrared and short wavelength optics;
Cross-disciplinary areas such as environmental, energy, food, agriculture and space technologies;
Other optical methods and applications.