用于水净化的缺陷 Zr-MOFs 功能化:从机理上揭示 -NH2 和 -SH 位点在去除 Hg(II) 离子中的竞争作用。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
ACS Applied Materials & Interfaces Pub Date : 2025-03-26 Epub Date: 2024-02-20 DOI:10.1021/acsami.3c15863
Zahra Sharifzadeh, Sayed Ali Akbar Razavi, Ali Morsali
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引用次数: 0

摘要

功能性金属有机框架(MOFs),尤其是基于硫原子和氮原子的功能性金属有机框架,经常被用于去除汞(II)离子。然而,关于 -SH 和 -NH2 功能在次生机制(质子转移和氧化还原)中的合作或竞争作用的系统研究仍然很少见。在这项研究中,UiO-66 框架(Zr6(OH)4O4(BDC)6, BDC2- = 苯-1,4-二甲酸酯)被装饰上了功能性单羧酸连接体,包括甘氨酸(Gly)、巯基丙酸(Mer)和半胱氨酸(Cys)。由于这些功能性连接体的分子相似性,可以比较胺和硫醇位点与 Hg(II) 离子的配位亲和性,并研究质子转移和氧化还原机制对硫醇--Hg(II) 和胺--Hg(II) 相互作用的影响。结果表明,Cys@UiO-66 框架能吸附 1288 mg g-1 的 Hg(II),而 Mer@UiO-66 和 Gly@UiO-66 在 pH = 7 和 500 ppm 条件下分别能吸附 593 和 313 mg g-1 的 Hg(II)。这是由于 Cys@UiO-66 框架中的胺和硫醇功能在去除 Hg(II) 离子的过程中表现出协同作用,次生机制降低了 Mer@UiO-66 框架中硫醇和 Gly@UiO-66 框架中胺在去除 Hg(II) 离子过程中的亲和力。Mer@UiO-66 中的游离 -SH 位点会氧化还原转化为 -SO3H 基团,而 Gly@UiO-66 中的游离质子化 -NH2 位点在去除 Hg(II) 离子的过程中不会完全去质子化。然而,在 Cys@UiO-66 中,游离质子化 -NH2 位点完全去质子化,游离 SH 位点在去除 Hg(II)过程中没有转化为 -SO3H 基团。这些观察结果表明,氧化还原和质子转移机制会对含有游离 -SH 和 -NH2 基团的功能 MOF 的吸附能力产生负面影响。因此,要提高功能 MOFs 与 Hg(II) 离子的亲和力,不仅要考虑功能化,还要控制去除过程中的次生机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Functionalization of Defective Zr-MOFs for Water Decontamination: Mechanistic Insight into the Competitive Roles of -NH<sub>2</sub> and -SH Sites in the Removal of Hg(II) Ions.

Functionalization of Defective Zr-MOFs for Water Decontamination: Mechanistic Insight into the Competitive Roles of -NH2 and -SH Sites in the Removal of Hg(II) Ions.

Functional metal-organic frameworks (MOFs), especially those based on sulfur and nitrogen atoms, were frequently applied for the removal of Hg(II) ions. However, a systematic study on the cooperative or competitive roles of -SH and -NH2 functions in the presence of secondary mechanisms (proton transfer and redox) is still rare. In this work, the UiO-66 framework (Zr6(OH)4O4(BDC)6, BDC2- = benzene-1,4-dicarboxylate) was decorated with functional monocarboxylate linkers including glycine (Gly), mercaptopropionic acid (Mer), and cysteine (Cys). Due to the molecular similarity of these functional linkers, the coordination affinity between the amine and thiol sites with Hg(II) ions can be compared, and the effect of proton transfer and redox mechanisms on the possible thiol···Hg(II) and amine···Hg(II) interactions can be investigated. The results show that the Cys@UiO-66 framework can adsorb 1288 mg g-1 of Hg(II), while Mer@UiO-66 and Gly@UiO-66 can adsorb 593 and 313 mg g-1 at pH = 7 and 500 ppm, respectively. This is due to the facts that both the amine and the thiol functions of the Cys@UiO-66 framework show synergism in Hg(II) removal, and the secondary mechanisms reduce the affinity of thiol in Mer@UiO-66 and amine in Gly@UiO-66 frameworks in the removal process of Hg(II) ions. Free -SH sites in Mer@UiO-66 undergo a redox convert to -SO3H groups, and free protonated -NH2 sites in Gly@UiO-66 do not fully deprotonate during Hg(II) removal. Yet, in the case of Cys@UiO-66, free protonated -NH2 sites are fully deprotonated, and free SH sites did not convert to -SO3H groups during Hg(II) removal. These observations show that the redox and proton transfer mechanisms can negatively affect the adsorption capacity of functional MOFs containing free -SH and -NH2 groups. So, not only the functionalization but also control over secondary mechanisms in the removal process are necessary parameters to improve the affinity between functional MOFs and Hg(II) ions.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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