聚合物基底上氧化铝薄膜的水蒸气渗透性

Zhuoting Cai, Yingke Chen, Xingyu Chen, Jiangyong Wang, S. Lian, Congkang Xu
{"title":"聚合物基底上氧化铝薄膜的水蒸气渗透性","authors":"Zhuoting Cai, Yingke Chen, Xingyu Chen, Jiangyong Wang, S. Lian, Congkang Xu","doi":"10.1002/pssb.202300454","DOIUrl":null,"url":null,"abstract":"\nHerein, the water vapor transmission rate (WVTR) of aluminum oxide (Al2O3) films on polyethylene terephthalate (PET) substrates is investigated and is focused on the impact of the film defects on the transmission rate. The aluminum oxide films are prepared on PET substrates by magnetron sputtering, and the effects of the film thickness, sputtering power, temperature, and bias voltage on the WVTR are studied. The surface morphologies of the films are examined using atomic force microscopy (AFM), and a method for obtaining the defect ratio of the film from AFM images is proposed. Subsequently, the influences of the defect ratio on the WVTR are quantitatively evaluated based on a 3D diffusion model. The simulated WVTR values are well in agreement with the experimental ones.","PeriodicalId":20107,"journal":{"name":"physica status solidi (b)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2024-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Water Vapor Permeation in Alumina Films on Polymer Substrates\",\"authors\":\"Zhuoting Cai, Yingke Chen, Xingyu Chen, Jiangyong Wang, S. Lian, Congkang Xu\",\"doi\":\"10.1002/pssb.202300454\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\nHerein, the water vapor transmission rate (WVTR) of aluminum oxide (Al2O3) films on polyethylene terephthalate (PET) substrates is investigated and is focused on the impact of the film defects on the transmission rate. The aluminum oxide films are prepared on PET substrates by magnetron sputtering, and the effects of the film thickness, sputtering power, temperature, and bias voltage on the WVTR are studied. The surface morphologies of the films are examined using atomic force microscopy (AFM), and a method for obtaining the defect ratio of the film from AFM images is proposed. Subsequently, the influences of the defect ratio on the WVTR are quantitatively evaluated based on a 3D diffusion model. The simulated WVTR values are well in agreement with the experimental ones.\",\"PeriodicalId\":20107,\"journal\":{\"name\":\"physica status solidi (b)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-02-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"physica status solidi (b)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1002/pssb.202300454\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"physica status solidi (b)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/pssb.202300454","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文研究了聚对苯二甲酸乙二酯(PET)基底上氧化铝(Al2O3)薄膜的水蒸气透过率(WVTR),并重点探讨了薄膜缺陷对透过率的影响。通过磁控溅射法在 PET 基质上制备了氧化铝薄膜,并研究了薄膜厚度、溅射功率、温度和偏置电压对 WVTR 的影响。使用原子力显微镜 (AFM) 观察了薄膜的表面形貌,并提出了一种从 AFM 图像中获取薄膜缺陷率的方法。随后,根据三维扩散模型定量评估了缺陷率对 WVTR 的影响。模拟的 WVTR 值与实验值十分吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Water Vapor Permeation in Alumina Films on Polymer Substrates
Herein, the water vapor transmission rate (WVTR) of aluminum oxide (Al2O3) films on polyethylene terephthalate (PET) substrates is investigated and is focused on the impact of the film defects on the transmission rate. The aluminum oxide films are prepared on PET substrates by magnetron sputtering, and the effects of the film thickness, sputtering power, temperature, and bias voltage on the WVTR are studied. The surface morphologies of the films are examined using atomic force microscopy (AFM), and a method for obtaining the defect ratio of the film from AFM images is proposed. Subsequently, the influences of the defect ratio on the WVTR are quantitatively evaluated based on a 3D diffusion model. The simulated WVTR values are well in agreement with the experimental ones.
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