胶体量子点上的平面阳离子钝化实现了高性能 0.35-1.8 μm 宽带 TFT 成像仪。

IF 27.4 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Yuxuan Liu, Jing Liu, Chengjie Deng, Bo Wang, Bing Xia, Xinyi Liang, Yang Yang, Shengman Li, Xihua Wang, Luying Li, Xinzheng Lan, Peng Fei, Jianbing Zhang, Liang Gao, Jiang Tang
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引用次数: 0

摘要

溶液加工的胶体量子点(CQDs)有望成为从可见光到短波红外(SWIR)的宽带光电探测器。然而,对长波 SWIR 敏感的大尺寸 PbS CQDs 主要暴露在表面的非极性(100)面上,缺乏稳健的钝化策略。本文介绍了一种采用平面阳离子的创新钝化策略,以实现(100)面上的面对面耦合,并加强(111)面上的卤化物钝化。CQDs 薄膜的缺陷密度(Eg ∼ 0.74 eV)从 2.74×1015 cm-3 降至 1.04×1015 cm-3,同时缺陷活化能降低了 0.1 eV。由此产生的 CQDs 光电二极管暗电流密度低至 14 nA cm-2,外部量子效率高达 62%,线性动态范围达到 98 dB,-3db 带宽为 103 kHz,探测率为 4.7×1011 Jones。我们的 CQDs 光电二极管的综合性能优于之前报道的工作波长大于 1.6 μm 的 CQDs 光电二极管。通过与薄膜晶体管(TFT)读出电路的单片集成,覆盖0.35-1.8 μm的宽带CQDs成像仪实现了硅片透视和材料分辨等功能,显示了其广泛的应用潜力。本文受版权保护。保留所有权利。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Planar Cation Passivation on Colloidal Quantum Dots Enables High-Performance 0.35–1.8 µm Broadband TFT Imager

Planar Cation Passivation on Colloidal Quantum Dots Enables High-Performance 0.35–1.8 µm Broadband TFT Imager

Solution-processed colloidal quantum dots (CQDs) are promising candidates for broadband photodetectors from visible light to shortwave infrared (SWIR). However, large-size PbS CQDs sensitive to longer SWIR are mainly exposed with nonpolar (100) facets on the surface, which lack robust passivation strategies. Herein, an innovative passivation strategy that employs planar cation, is introduced to enable face-to-face coupling on (100) facets and strengthen halide passivation on (111) facets. The defect density of CQDs film (Eg ≈ 0.74 eV) is reduced from 2.74 × 1015 to 1.04  × 1015 cm−3, coupled with 0.1 eV reduction in the activation energy of defects. The resultant CQDs photodiodes exhibit a low dark current density of 14 nA cm−2 with a high external quantum efficiency (EQE) of 62%, achieving a linear dynamic range of 98 dB, a −3dB bandwidth of 103 kHz and a detectivity of 4.7 × 1011 Jones. The comprehensive performance of the CQDs photodiodes outperforms previously reported CQDs photodiodes operating at >1.6 µm. By monolithically integrated with thin-film transistor (TFT) readout circuit, the broadband CQDs imager covering 0.35-1.8 µm realizes the functions including silicon wafer perspectivity and material discrimination, showing its potential for wide range of applications.

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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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