Optimizing the management, control, and computation of skin depth in laminated structures considering reflection effects

This study introduces an alternative method for calculating multilayered skin depth in laminated structures. It concentrates on locating the layer where the skin effect occurs and developing a novel formula for skin depth. This method involves attenuating the electric field as it traverses the layers of the structure until it reaches the 1/e point. The equation's resolution considers the reflection that occurs when electromagnetic wave transitions between layers. To execute computations with precision and efficiency, a numerical algorithm is implemented. An in-depth examination will be conducted to identify materials in the first, second, and third positions within the multilayer structure, where the skin effect may manifest in specific frequency ranges, including those defined by the IEEE. The approach provides a reliable mean to precisely control the skin effect's location in complex multilayered structures and select materials to minimize or maximize its impact as needed.