用于声表面波器件频率控制高精度光刻的光学比色钽酸锂晶片

IF 6.6 1区 物理与天体物理 Q1 OPTICS
Ming Hui Fang, Yinong Xie, Fangqi Xue, Zhilin Wu, Jun Shi, Sheng Yu Yang, Yilin Liu, Zhihuang Liu, Hsin Chi Wang, Fajun Li, Qing Huo Liu, and Jinfeng Zhu
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引用次数: 0

摘要

基于钽酸锂(LT,LiTaO3LiTaO3)晶片的声表面波(SAW)谐振器是移动通信滤波器的关键元件。由于在光刻过程中会产生强烈的紫外线反射,使用本征钽酸锂晶片通常会导致声表面波谐振器的制造精度较低。这严重影响了工业生产中对谐振频率的控制。为了实现高光刻精度,可以采用掺杂 LT 和化学还原的方法来降低 LT 硅片的紫外线反射。然而,传统方法无法提供一种快速、无损的方法来识别用于高精度频率控制的标准单面抛光 LT 硅片的紫外线性能。在此,我们提出了一种基于还原掺铁 LT 硅片比色法的便捷在线检测方案,并建立了一套适用于工业应用的自动测试系统。铁掺杂和化学还原水平通过基于 LT 的晶片的亮度和色差进行评估。建立了晶片可见光比色法与紫外反射之间的相关性,从而完善了光刻工艺,并有针对性地控制了声表面波谐振器的频率性能。我们的研究为声表谐振器的制造控制提供了强有力的工具,并将在移动通信的精密设备上激发更多应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical colorimetric LiTaO3 wafers for high-precision lithography on frequency control of SAW devices
Surface acoustic wave (SAW) resonators based on lithium tantalate (LT, LiTaO3) wafers are crucial elements of mobile communication filters. The use of intrinsic LT wafers typically brings about low fabrication accuracy of SAW resonators due to strong UV reflection in the lithography process. This hinders their resonance frequency control seriously in industrial manufacture. LT doping and chemical reduction could be applied to decrease the UV reflection of LT wafers for high lithographic precision. However, conventional methods fail to provide a fast and nondestructive approach to identify the UV performance of standard single-side polished LT wafers for high-precision frequency control. Here, we propose a convenient on-line sensing scheme based on the colorimetry of reduced Fe-doped LT wafers and build up an automatic testing system for industrial applications. The levels of Fe doping and chemical reduction are evaluated by the lightness and color difference of LT-based wafers. The correlation between the wafer visible colorimetry and UV reflection is established to refine the lithography process and specifically manipulate the frequency performance of SAW resonators. Our study provides a powerful tool for the fabrication control of SAW resonators and will inspire more applications on sophisticated devices of mobile communication.
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来源期刊
CiteScore
13.60
自引率
5.30%
发文量
1325
期刊介绍: Photonics Research is a joint publishing effort of the OSA and Chinese Laser Press.It publishes fundamental and applied research progress in optics and photonics. Topics include, but are not limited to, lasers, LEDs and other light sources; fiber optics and optical communications; imaging, detectors and sensors; novel materials and engineered structures; optical data storage and displays; plasmonics; quantum optics; diffractive optics and guided optics; medical optics and biophotonics; ultraviolet and x-rays; terahertz technology.
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