钐钴厚膜中相间耦合的微观结构演变和一阶反转曲线分析

IF 16.4 1区 化学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Oksana Koplak;Federico Maspero;Alejandro Plaza;Andrea Del Giacco;Maria Cocconcelli;Riccardo Bertacco
{"title":"钐钴厚膜中相间耦合的微观结构演变和一阶反转曲线分析","authors":"Oksana Koplak;Federico Maspero;Alejandro Plaza;Andrea Del Giacco;Maria Cocconcelli;Riccardo Bertacco","doi":"10.1109/LMAG.2023.3344026","DOIUrl":null,"url":null,"abstract":"Thick SmCo films of 500 nm thickness were deposited by radio frequency sputtering in W/SmCo/W structures on a Si substrate. After annealing at 650–750 °C, the as-grown soft amorphous structure transforms into a mixture of crystalline Sm\n<sub>2</sub>\nCo\n<sub>17</sub>\n and SmCo\n<sub>5</sub>\n hard magnetic phases. Annealing at 650 °C leads to film crystallization with an average grain size of 64 nm, coercivity of 0.5 T, and remanence magnetization of about 0.5 T for a maximum applied field of 2 T. The remanence magnetization decreases by 20% upon annealing at 750 °C, whereas the average crystalline size and coercivity increase up to 73 nm and 1.1 T, respectively. Series of the first-order reversal curves recorded in the samples that were annealed at 650 °C and 750 °C demonstrate redistribution of the switching fields between the softer (Sm\n<sub>2</sub>\nCo\n<sub>17)</sub>\n and harder (SmCo\n<sub>5</sub>\n) phases, depending on the strength of interphase interaction. Overall, the higher remanence and sizable coercivity of films annealed at 650 °C make them good candidates for the fabrication of micromagnets to be integrated in microelectromechanical systems.","PeriodicalId":1,"journal":{"name":"Accounts of Chemical Research","volume":null,"pages":null},"PeriodicalIF":16.4000,"publicationDate":"2023-12-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Microstructure Evolution and First-Order Reversal Curve Analysis of the Interphase Coupling in SmCo Thick Film\",\"authors\":\"Oksana Koplak;Federico Maspero;Alejandro Plaza;Andrea Del Giacco;Maria Cocconcelli;Riccardo Bertacco\",\"doi\":\"10.1109/LMAG.2023.3344026\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Thick SmCo films of 500 nm thickness were deposited by radio frequency sputtering in W/SmCo/W structures on a Si substrate. After annealing at 650–750 °C, the as-grown soft amorphous structure transforms into a mixture of crystalline Sm\\n<sub>2</sub>\\nCo\\n<sub>17</sub>\\n and SmCo\\n<sub>5</sub>\\n hard magnetic phases. Annealing at 650 °C leads to film crystallization with an average grain size of 64 nm, coercivity of 0.5 T, and remanence magnetization of about 0.5 T for a maximum applied field of 2 T. The remanence magnetization decreases by 20% upon annealing at 750 °C, whereas the average crystalline size and coercivity increase up to 73 nm and 1.1 T, respectively. Series of the first-order reversal curves recorded in the samples that were annealed at 650 °C and 750 °C demonstrate redistribution of the switching fields between the softer (Sm\\n<sub>2</sub>\\nCo\\n<sub>17)</sub>\\n and harder (SmCo\\n<sub>5</sub>\\n) phases, depending on the strength of interphase interaction. Overall, the higher remanence and sizable coercivity of films annealed at 650 °C make them good candidates for the fabrication of micromagnets to be integrated in microelectromechanical systems.\",\"PeriodicalId\":1,\"journal\":{\"name\":\"Accounts of Chemical Research\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":16.4000,\"publicationDate\":\"2023-12-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Accounts of Chemical Research\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10363408/\",\"RegionNum\":1,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Accounts of Chemical Research","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10363408/","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

通过射频溅射法在硅衬底上沉积了 W/SmCo/W 结构的 500 nm 厚钐钴薄膜。在 650-750 °C 退火后,生长的软质无定形结构转变为结晶 Sm2Co17 和 SmCo5 硬磁相的混合物。在 650 °C 退火后,薄膜结晶,平均晶粒大小为 64 nm,矫顽力为 0.5 T,在最大外加磁场为 2 T 时,剩磁约为 0.5 T;在 750 °C 退火后,剩磁降低了 20%,而平均晶粒大小和矫顽力则分别增加到 73 nm 和 1.1 T。在 650 ℃ 和 750 ℃ 下退火的样品记录的一阶反转曲线系列表明,开关场在较软(Sm2Co17)和较硬(SmCo5)相之间重新分布,这取决于相间相互作用的强度。总之,在 650 ℃ 下退火的薄膜具有较高的剩磁和相当大的矫顽力,是制造集成到微机电系统中的微型磁体的理想材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Microstructure Evolution and First-Order Reversal Curve Analysis of the Interphase Coupling in SmCo Thick Film
Thick SmCo films of 500 nm thickness were deposited by radio frequency sputtering in W/SmCo/W structures on a Si substrate. After annealing at 650–750 °C, the as-grown soft amorphous structure transforms into a mixture of crystalline Sm 2 Co 17 and SmCo 5 hard magnetic phases. Annealing at 650 °C leads to film crystallization with an average grain size of 64 nm, coercivity of 0.5 T, and remanence magnetization of about 0.5 T for a maximum applied field of 2 T. The remanence magnetization decreases by 20% upon annealing at 750 °C, whereas the average crystalline size and coercivity increase up to 73 nm and 1.1 T, respectively. Series of the first-order reversal curves recorded in the samples that were annealed at 650 °C and 750 °C demonstrate redistribution of the switching fields between the softer (Sm 2 Co 17) and harder (SmCo 5 ) phases, depending on the strength of interphase interaction. Overall, the higher remanence and sizable coercivity of films annealed at 650 °C make them good candidates for the fabrication of micromagnets to be integrated in microelectromechanical systems.
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来源期刊
Accounts of Chemical Research
Accounts of Chemical Research 化学-化学综合
CiteScore
31.40
自引率
1.10%
发文量
312
审稿时长
2 months
期刊介绍: Accounts of Chemical Research presents short, concise and critical articles offering easy-to-read overviews of basic research and applications in all areas of chemistry and biochemistry. These short reviews focus on research from the author’s own laboratory and are designed to teach the reader about a research project. In addition, Accounts of Chemical Research publishes commentaries that give an informed opinion on a current research problem. Special Issues online are devoted to a single topic of unusual activity and significance. Accounts of Chemical Research replaces the traditional article abstract with an article "Conspectus." These entries synopsize the research affording the reader a closer look at the content and significance of an article. Through this provision of a more detailed description of the article contents, the Conspectus enhances the article's discoverability by search engines and the exposure for the research.
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