{"title":"大气等离子体紫外线辐射诱导的 HMDS 光化学离子化学和离子薄膜沉积","authors":"Tristan Winzer, Jan Benedikt","doi":"10.1002/ppap.202300226","DOIUrl":null,"url":null,"abstract":"Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that <mjx-container aria-label=\"SiO Subscript 2\" ctxtmenu_counter=\"0\" ctxtmenu_oldtabindex=\"1\" jax=\"CHTML\" role=\"application\" sre-explorer- style=\"font-size: 103%; position: relative;\" tabindex=\"0\"><mjx-math aria-hidden=\"true\" location=\"graphic/ppap202300226-math-0001.png\"><mjx-semantics><mjx-mrow><mjx-msub data-semantic-children=\"0,1\" data-semantic- data-semantic-role=\"unknown\" data-semantic-speech=\"SiO Subscript 2\" data-semantic-type=\"subscript\"><mjx-mtext data-semantic-annotation=\"clearspeak:unit\" data-semantic-font=\"normal\" data-semantic- data-semantic-parent=\"2\" data-semantic-role=\"unknown\" data-semantic-type=\"text\"><mjx-c></mjx-c><mjx-c></mjx-c><mjx-c></mjx-c></mjx-mtext><mjx-script style=\"vertical-align: -0.15em;\"><mjx-mn data-semantic-annotation=\"clearspeak:simple\" data-semantic-font=\"normal\" data-semantic- data-semantic-parent=\"2\" data-semantic-role=\"integer\" data-semantic-type=\"number\" size=\"s\"><mjx-c></mjx-c></mjx-mn></mjx-script></mjx-msub></mjx-mrow></mjx-semantics></mjx-math><mjx-assistive-mml aria-hidden=\"true\" display=\"inline\" unselectable=\"on\"><math altimg=\"urn:x-wiley:16128850:media:ppap202300226:ppap202300226-math-0001\" location=\"graphic/ppap202300226-math-0001.png\" xmlns=\"http://www.w3.org/1998/Math/MathML\"><semantics><mrow><msub data-semantic-=\"\" data-semantic-children=\"0,1\" data-semantic-role=\"unknown\" data-semantic-speech=\"SiO Subscript 2\" data-semantic-type=\"subscript\"><mtext data-semantic-=\"\" data-semantic-annotation=\"clearspeak:unit\" data-semantic-font=\"normal\" data-semantic-parent=\"2\" data-semantic-role=\"unknown\" data-semantic-type=\"text\">SiO</mtext><mn data-semantic-=\"\" data-semantic-annotation=\"clearspeak:simple\" data-semantic-font=\"normal\" data-semantic-parent=\"2\" data-semantic-role=\"integer\" data-semantic-type=\"number\">2</mn></msub></mrow>${\\text{SiO}}_{2}$</annotation></semantics></math></mjx-assistive-mml></mjx-container>-like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":null,"pages":null},"PeriodicalIF":2.9000,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ion chemistry and ionic thin film deposition from HMDS-photochemistry induced by VUV-radiation from an atmospheric plasma\",\"authors\":\"Tristan Winzer, Jan Benedikt\",\"doi\":\"10.1002/ppap.202300226\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that <mjx-container aria-label=\\\"SiO Subscript 2\\\" ctxtmenu_counter=\\\"0\\\" ctxtmenu_oldtabindex=\\\"1\\\" jax=\\\"CHTML\\\" role=\\\"application\\\" sre-explorer- style=\\\"font-size: 103%; position: relative;\\\" tabindex=\\\"0\\\"><mjx-math aria-hidden=\\\"true\\\" location=\\\"graphic/ppap202300226-math-0001.png\\\"><mjx-semantics><mjx-mrow><mjx-msub data-semantic-children=\\\"0,1\\\" data-semantic- data-semantic-role=\\\"unknown\\\" data-semantic-speech=\\\"SiO Subscript 2\\\" data-semantic-type=\\\"subscript\\\"><mjx-mtext data-semantic-annotation=\\\"clearspeak:unit\\\" data-semantic-font=\\\"normal\\\" data-semantic- data-semantic-parent=\\\"2\\\" data-semantic-role=\\\"unknown\\\" data-semantic-type=\\\"text\\\"><mjx-c></mjx-c><mjx-c></mjx-c><mjx-c></mjx-c></mjx-mtext><mjx-script style=\\\"vertical-align: -0.15em;\\\"><mjx-mn data-semantic-annotation=\\\"clearspeak:simple\\\" data-semantic-font=\\\"normal\\\" data-semantic- data-semantic-parent=\\\"2\\\" data-semantic-role=\\\"integer\\\" data-semantic-type=\\\"number\\\" size=\\\"s\\\"><mjx-c></mjx-c></mjx-mn></mjx-script></mjx-msub></mjx-mrow></mjx-semantics></mjx-math><mjx-assistive-mml aria-hidden=\\\"true\\\" display=\\\"inline\\\" unselectable=\\\"on\\\"><math altimg=\\\"urn:x-wiley:16128850:media:ppap202300226:ppap202300226-math-0001\\\" location=\\\"graphic/ppap202300226-math-0001.png\\\" xmlns=\\\"http://www.w3.org/1998/Math/MathML\\\"><semantics><mrow><msub data-semantic-=\\\"\\\" data-semantic-children=\\\"0,1\\\" data-semantic-role=\\\"unknown\\\" data-semantic-speech=\\\"SiO Subscript 2\\\" data-semantic-type=\\\"subscript\\\"><mtext data-semantic-=\\\"\\\" data-semantic-annotation=\\\"clearspeak:unit\\\" data-semantic-font=\\\"normal\\\" data-semantic-parent=\\\"2\\\" data-semantic-role=\\\"unknown\\\" data-semantic-type=\\\"text\\\">SiO</mtext><mn data-semantic-=\\\"\\\" data-semantic-annotation=\\\"clearspeak:simple\\\" data-semantic-font=\\\"normal\\\" data-semantic-parent=\\\"2\\\" data-semantic-role=\\\"integer\\\" data-semantic-type=\\\"number\\\">2</mn></msub></mrow>${\\\\text{SiO}}_{2}$</annotation></semantics></math></mjx-assistive-mml></mjx-container>-like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. 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Ion chemistry and ionic thin film deposition from HMDS-photochemistry induced by VUV-radiation from an atmospheric plasma
Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that -like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.
期刊介绍:
Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.