Ciro Pentangelo, Niki Di Giano, Simone Piacentini, Riccardo Arpe, Francesco Ceccarelli, Andrea Crespi, Roberto Osellame
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High-fidelity and polarization-insensitive universal photonic processors fabricated by femtosecond laser writing
Universal photonic processors (UPPs) are fully programmable photonic integrated circuits that are key components in quantum photonics. With this work, we present a novel platform for the realization of low-loss, low-power, and high-fidelity UPPs based on femtosecond laser writing (FLW) and compatible with a large wavelength spectrum. In fact, we demonstrate different UPPs, tailored for operation at 785 nm and 1550 nm, providing similar high-level performances. Moreover, we show that standard calibration techniques applied to FLW-UPPs result in Haar random polarization-insensitive photonic transformations implemented with average amplitude fidelity as high as 0.9979 at 785 nm (0.9970 at 1550 nm), with the possibility of increasing the fidelity over 0.9990 thanks to novel optimization algorithms. Besides being the first demonstrations of polarization-insensitive UPPs, these devices show the highest level of control and reconfigurability ever reported for a FLW circuit. These qualities will be greatly beneficial to applications in quantum information processing.
期刊介绍:
Nanophotonics, published in collaboration with Sciencewise, is a prestigious journal that showcases recent international research results, notable advancements in the field, and innovative applications. It is regarded as one of the leading publications in the realm of nanophotonics and encompasses a range of article types including research articles, selectively invited reviews, letters, and perspectives.
The journal specifically delves into the study of photon interaction with nano-structures, such as carbon nano-tubes, nano metal particles, nano crystals, semiconductor nano dots, photonic crystals, tissue, and DNA. It offers comprehensive coverage of the most up-to-date discoveries, making it an essential resource for physicists, engineers, and material scientists.