高传输率下的约瑟夫森动力学和夏皮罗阶跃：电流偏置机制。

IF 2.6 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Beilstein Journal of Nanotechnology Pub Date : 2024-01-11 eCollection Date: 2024-01-01 DOI:10.3762/bjnano.15.5

Artem V Galaktionov, Andrei D Zaikin

{"title":"高传输率下的约瑟夫森动力学和夏皮罗阶跃：电流偏置机制。","authors":"Artem V Galaktionov, Andrei D Zaikin","doi":"10.3762/bjnano.15.5","DOIUrl":null,"url":null,"abstract":"We investigate Josephson dynamics of highly transparent superconducting nanojunctions at subgap voltages and temperatures. In this limit, intrinsic dissipation in such junctions turns out to be sub-Ohmic, which yields a linear dependence of the average voltage on the bias current I slightly exceeding the critical one Ic. We demonstrate a strong impact of intrinsic sub-Ohmic dissipation on integer Shapiro steps appearing on the I-V curve in the presence of external microwave radiation.","PeriodicalId":8802,"journal":{"name":"Beilstein Journal of Nanotechnology","volume":"15 ","pages":"51-56"},"PeriodicalIF":2.6000,"publicationDate":"2024-01-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10790642/pdf/","citationCount":"0","resultStr":"{\"title\":\"Josephson dynamics and Shapiro steps at high transmissions: current bias regime.\",\"authors\":\"Artem V Galaktionov, Andrei D Zaikin\",\"doi\":\"10.3762/bjnano.15.5\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We investigate Josephson dynamics of highly transparent superconducting nanojunctions at subgap voltages and temperatures. In this limit, intrinsic dissipation in such junctions turns out to be sub-Ohmic, which yields a linear dependence of the average voltage on the bias current I slightly exceeding the critical one Ic. We demonstrate a strong impact of intrinsic sub-Ohmic dissipation on integer Shapiro steps appearing on the I-V curve in the presence of external microwave radiation.\",\"PeriodicalId\":8802,\"journal\":{\"name\":\"Beilstein Journal of Nanotechnology\",\"volume\":\"15 \",\"pages\":\"51-56\"},\"PeriodicalIF\":2.6000,\"publicationDate\":\"2024-01-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10790642/pdf/\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Beilstein Journal of Nanotechnology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.3762/bjnano.15.5\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"2024/1/1 0:00:00\",\"PubModel\":\"eCollection\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Beilstein Journal of Nanotechnology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3762/bjnano.15.5","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/1/1 0:00:00","PubModel":"eCollection","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

摘要

我们研究了高度透明超导纳米结在亚隙电压和温度下的约瑟夫森动力学。在此极限下，此类结的本征耗散为亚欧姆耗散，从而产生了平均电压对偏置电流 I 的线性依赖性，略微超过临界值 Ic。我们证明了在外部微波辐射存在的情况下，亚欧姆本征耗散对 I-V 曲线上出现的整数夏皮罗阶跃有很大影响。

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Josephson dynamics and Shapiro steps at high transmissions: current bias regime.

We investigate Josephson dynamics of highly transparent superconducting nanojunctions at subgap voltages and temperatures. In this limit, intrinsic dissipation in such junctions turns out to be sub-Ohmic, which yields a linear dependence of the average voltage on the bias current I slightly exceeding the critical one I_c. We demonstrate a strong impact of intrinsic sub-Ohmic dissipation on integer Shapiro steps appearing on the I-V curve in the presence of external microwave radiation.

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来源期刊

Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

5.70

自引率

3.20%

发文量

109

审稿时长

2 months

期刊介绍： The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.