研究介电薄膜在 MHz sub-ps 机制下的激光诱导污染问题

IF 2.3 Q2 OPTICS
M. Stehlik, J. Zideluns, Camille Petite, Valentin Allard, Marco Minissale, A. Moreau, A. Lereu, F. Lemarchand, Frank Wagner, Julien Lumeau, Laurent Gallais
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引用次数: 0

摘要

高重复率二极管泵浦亚 ps 激光器广泛应用于工业领域的高质量材料加工应用。然而,为了保证其可靠运行,研究这些系统中使用的光学元件的功率处理能力至关重要。反射镜、光栅、分色滤光片和增益介质等光学元件都是基于介电薄膜设计的。当受到高强度激光辐射时,激光诱导污染(LIC)现象会导致受辐射光学表面生长出纳米级的高吸收层,从而导致传输或反射损失,最终造成永久性损坏。在本研究中,我们研究了在 515 纳米 MHz sub-ps 激光照射的空气环境中,介质氧化物薄膜上的 LIC 生长情况。我们研究了薄膜沉积方法、材料和厚度对 LIC 生长动态的影响。我们采用多种观察方法,包括白光干涉显微镜和荧光成像,对表面的辐照点进行了检测。我们的结果表明,LIC 的生长动态取决于激光强度和辐照时间,并且会受到薄膜沉积方法、材料和厚度的影响。这些发现可用于开发更耐久的光学元件,确保工业应用所需的激光长期可靠运行。这项研究强调了使用接近真实世界应用的测试来验证光学元件的必要性,并提供了对导致 LIC 的复杂过程的深入了解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of laser-induced contamination on dielectric thin films in MHz sub-ps regime
High-repetition rate diode-pumped sub-ps lasers are widely used in the industrial sector for high-quality material processing applications. However, for their reliable operation, it is crucial to study the power handling capabilities of the optical components used in these systems. The optical components, such as mirrors, gratings, dichroic filters, and gain media, are designed based on dielectric thin films. When subjected to high-intensity laser radiation, the phenomenon of laser-induced contamination (LIC) can lead to the growth of a nanometric, highly absorbent layer on an irradiated optical surface, which can result in transmission or reflection loss and eventual permanent damage. In this study, we investigate LIC growth on dielectric oxide thin films in an air environment irradiated by MHz sub-ps laser at 515 nm. We examine the effect of thin film deposition method, material, and thickness on LIC growth dynamics. The irradiated spots on the surface are inspected using multiple observation methods, including white light interference microscopy and fluorescence imaging. Our results show that the LIC growth dynamics depend on the laser intensity and irradiation time and can be affected by the thin film deposition method, material, and thickness. These findings could be used to inform the development of more resistant optical components, ensuring long-term reliable laser operation required for industrial applications. The study highlights the need for validating optical components using tests that closely mimic real-world applications and provides insight into the complex processes that lead to LIC.
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来源期刊
CiteScore
4.40
自引率
0.00%
发文量
23
期刊介绍: Advanced Optical Technologies is a strictly peer-reviewed scientific journal. The major aim of Advanced Optical Technologies is to publish recent progress in the fields of optical design, optical engineering, and optical manufacturing. Advanced Optical Technologies has a main focus on applied research and addresses scientists as well as experts in industrial research and development. Advanced Optical Technologies partners with the European Optical Society (EOS). All its 4.500+ members have free online access to the journal through their EOS member account. Topics: Optical design, Lithography, Opto-mechanical engineering, Illumination and lighting technology, Precision fabrication, Image sensor devices, Optical materials (polymer based, inorganic, crystalline/amorphous), Optical instruments in life science (biology, medicine, laboratories), Optical metrology, Optics in aerospace/defense, Simulation, interdisciplinary, Optics for astronomy, Standards, Consumer optics, Optical coatings.
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