电子显微镜中的电压对比：从奇异效应到调试现代集成电路

EDFA Technical Articles Pub Date : 2023-11-01 DOI:10.31399/asm.edfa.2023-4.p028

James Vickers, Blake Freeman, Neel Leslie

{"title":"电子显微镜中的电压对比：从奇异效应到调试现代集成电路","authors":"James Vickers, Blake Freeman, Neel Leslie","doi":"10.31399/asm.edfa.2023-4.p028","DOIUrl":null,"url":null,"abstract":"A scanning electron microscope system measures voltage contrast on device-under-test surfaces. This article addresses a limited set of applications that rely on voltage contrast (VC) measurements in SEM systems, showing how VC measurements can probe electrical activity running at speeds as high as 2 GHz on modern active integrated circuits.","PeriodicalId":431761,"journal":{"name":"EDFA Technical Articles","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Voltage Contrast within Electron Microscopy: From a Curious Effect to Debugging Modern ICs\",\"authors\":\"James Vickers, Blake Freeman, Neel Leslie\",\"doi\":\"10.31399/asm.edfa.2023-4.p028\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A scanning electron microscope system measures voltage contrast on device-under-test surfaces. This article addresses a limited set of applications that rely on voltage contrast (VC) measurements in SEM systems, showing how VC measurements can probe electrical activity running at speeds as high as 2 GHz on modern active integrated circuits.\",\"PeriodicalId\":431761,\"journal\":{\"name\":\"EDFA Technical Articles\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"EDFA Technical Articles\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.31399/asm.edfa.2023-4.p028\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"EDFA Technical Articles","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.edfa.2023-4.p028","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

扫描电子显微镜系统测量被测设备表面的电压对比度。本文讨论了扫描电子显微镜系统中依赖电压对比度（VC）测量的一组有限应用，展示了电压对比度测量如何探测现代有源集成电路上以高达 2 GHz 的速度运行的电气活动。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Voltage Contrast within Electron Microscopy: From a Curious Effect to Debugging Modern ICs

A scanning electron microscope system measures voltage contrast on device-under-test surfaces. This article addresses a limited set of applications that rely on voltage contrast (VC) measurements in SEM systems, showing how VC measurements can probe electrical activity running at speeds as high as 2 GHz on modern active integrated circuits.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

EDFA Technical Articles

自引率

0.00%

发文量