Michael DiBattista, Scott Silverman, Matthew M. Mulholland
{"title":"用于半导体调试应用的激光沉铜技术","authors":"Michael DiBattista, Scott Silverman, Matthew M. Mulholland","doi":"10.31399/asm.edfa.2023-4.p012","DOIUrl":null,"url":null,"abstract":"Laser-assisted copper deposition provides a key technology for analyzing complex packaging and integrated circuit challenges. Laser-based copper deposition techniques have been shown to be useful in combination with traditional FIB techniques to improve resistivity, deposition rate, and timing.","PeriodicalId":431761,"journal":{"name":"EDFA Technical Articles","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Laser-Based Copper Deposition for Semiconductor Debug Applications\",\"authors\":\"Michael DiBattista, Scott Silverman, Matthew M. Mulholland\",\"doi\":\"10.31399/asm.edfa.2023-4.p012\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Laser-assisted copper deposition provides a key technology for analyzing complex packaging and integrated circuit challenges. Laser-based copper deposition techniques have been shown to be useful in combination with traditional FIB techniques to improve resistivity, deposition rate, and timing.\",\"PeriodicalId\":431761,\"journal\":{\"name\":\"EDFA Technical Articles\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"EDFA Technical Articles\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.31399/asm.edfa.2023-4.p012\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"EDFA Technical Articles","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31399/asm.edfa.2023-4.p012","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Laser-Based Copper Deposition for Semiconductor Debug Applications
Laser-assisted copper deposition provides a key technology for analyzing complex packaging and integrated circuit challenges. Laser-based copper deposition techniques have been shown to be useful in combination with traditional FIB techniques to improve resistivity, deposition rate, and timing.
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