掺杂金属氧化物(RuO2、CuO、MnO2)的硅酸盐玻璃中的杂质带和状态密度

G. Abdurakhmanov, A. Dekhkanov, M. Tursunov, D. Tashmukhamedova
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引用次数: 0

摘要

本文通过假设和隧道微探针光谱法研究了硅酸盐玻璃中由于钌、铜、锰氧化物的双重合金化而形成的杂质带以及其中电子状态密度的变化情况。实验结果使用 Wolfram Mathematica 11 软件进行处理。实验发现,在室温左右,杂质带与玻璃的价带相接触或合并。在高温下(约 1000 K),杂质带与玻璃的价带分离,两者之间出现了一个伪间隙。因此,掺杂硅酸盐玻璃在室温下具有金属导电性,但在高温下则具有半导体(活化)导电性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impurity Bands and Density of State in Doped Silicate Glasses with Metal Oxides (RuO2, CuO, MnO2)
In this article, as a result of double alloying with ruthenium, copper, manganese oxides, the formation of an impurity band in silicate glass and how the density of electron states changes in it was studied by hypothetical and tunneling microprobe spectroscopy. The results of the experiment were processed using Wolfram Mathematica 11 software. It was found that around room temperature, the impurity band touches or merges with the valence band of the glass. At a high temperature (around 1000 K), the impurity band separates from the valence band of the glass, and a pseudo-gap appears between them. As a result, doped silicate glass exhibits metallic conductivity at room temperature, but at high temperatures, it has semiconductor (activation) conductivity.
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