用于电阻式开关存储器的硫化钴薄膜

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, APPLIED
Shyankay Jou, Muhammad Hawary Assa, Bohr-Ran Huang, Xin-Wei Huang
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引用次数: 0

摘要

通过对用于电阻开关(RS)存储器的钴薄膜表面进行硫化,形成了由 CoS2 和 Co9S8 纳米晶粒组成的硫化钴(CoSx)薄膜。经测量,CoSx 薄膜的功函数和带隙分别为 4.78 eV 和 2.18 eV。CoSx 薄膜用作电阻层,下面的 Co 薄膜用作底电极,Ag 或 Cu 薄膜用作顶电极。Ag/CoSx/Co 和 Cu/CoSx/Co 器件都表现出双极 RS 行为,具有多级存储能力。这两种器件在低电阻状态下的传导与欧姆传导后的金属丝路径有关,而在高电阻状态下,源自 Ag/CoSx 和 Cu/CoSx 接口的肖特基发射占主导地位。对 Ag/CoSx/Co 和 Cu/CoSx/Co 器件的性能进行了比较,并将其与 Ag 和 Cu 电极的特性联系起来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Cobalt sulfide films by sulfurizing cobalt for resistive switching memory
A cobalt sulfide (CoS x ) film compromising CoS2 and Co9S8 nanograins was formed by sulfurizing the surface of a Co film to use for resistive switching (RS) memory. The work function and band gap of the CoS x film were measured to be 4.78 eV and 2.18 eV, respectively. The CoS x film was used as a resistive layer together with the Co film underneath as a bottom electrode, and a Ag or Cu film as the top electrode. Both Ag/CoS x /Co and Cu/CoS x /Co devices exhibited bipolar RS behavior with the capability of multi-level memory storage. The conduction of both devices in low resistive states was correlated with metallic filamentary paths following ohmic conduction, whereas Schottky emission originated at the Ag/CoS x and Cu/CoS x interfaces dominated in the high resistance state. The performance of Ag/CoS x /Co and Cu/CoS x /Co devices were compared and correlated with the properties of Ag and Cu electrodes.
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来源期刊
Japanese Journal of Applied Physics
Japanese Journal of Applied Physics 物理-物理:应用
CiteScore
3.00
自引率
26.70%
发文量
818
审稿时长
3.5 months
期刊介绍: The Japanese Journal of Applied Physics (JJAP) is an international journal for the advancement and dissemination of knowledge in all fields of applied physics. JJAP is a sister journal of the Applied Physics Express (APEX) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP). JJAP publishes articles that significantly contribute to the advancements in the applications of physical principles as well as in the understanding of physics in view of particular applications in mind. Subjects covered by JJAP include the following fields: • Semiconductors, dielectrics, and organic materials • Photonics, quantum electronics, optics, and spectroscopy • Spintronics, superconductivity, and strongly correlated materials • Device physics including quantum information processing • Physics-based circuits and systems • Nanoscale science and technology • Crystal growth, surfaces, interfaces, thin films, and bulk materials • Plasmas, applied atomic and molecular physics, and applied nuclear physics • Device processing, fabrication and measurement technologies, and instrumentation • Cross-disciplinary areas such as bioelectronics/photonics, biosensing, environmental/energy technologies, and MEMS
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