使用高度校准标准光栅和非线性回归函数确定有涂层和无涂层硅原子力显微镜尖头的半径。

IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Beilstein Journal of Nanotechnology Pub Date : 2023-12-15 eCollection Date: 2023-01-01 DOI:10.3762/bjnano.14.99
Perawat Boonpuek, Jonathan Robert Felts
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引用次数: 0

摘要

在多个研究领域,原子力显微镜尖头被用于表征纳米结构和量化材料的机械特性。如果我们不知道原子力显微镜针尖半径的精确值,分析结果就会出现无法预测的误差。有许多原位测量技术可以确定实际的原子力显微镜针尖半径,但它们仅限于未涂层的针尖。本文提出了另一种简单的方法来确定涂层针尖和未涂层针尖的半径。使用铂涂层、铬/金涂层和未涂层硅针尖,在原子力显微镜接触模式下以亚纳牛顿载荷扫描校准标准光栅,以获得光栅结构边角的曲线扫描轮廓。用非线性回归函数拟合每个针尖弯曲轮廓的数据点,以估计针尖的曲率半径。结果表明,涂层针尖的估计半径在针尖制造商提供的标称值范围内,而未涂层硅针尖的估计半径大于标称半径,因为针尖在扫描过程中会变钝。不过,这种方法能准确估计针尖半径,曲线拟合结果的均方根误差很小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determination of the radii of coated and uncoated silicon AFM sharp tips using a height calibration standard grating and a nonlinear regression function.

AFM sharp tips are used to characterize nanostructures and quantify the mechanical properties of the materials in several areas of research. The analytical results can show unpredicted errors if we do not know the exact values of the AFM tip radius. There are many techniques of in situ measurements for determining the actual AFM tip radius, but they are limited to uncoated tips. This paper presents an alternative and simple method to determine the radii of coated tips and an uncoated tip. Pt-coated, Cr/Au-coated, and uncoated Si tips were used to scan a calibration standard grating in AFM contact mode with sub-nanonewton load to obtain the curved scan profile of the edge corner of the grating structure. The data points of the curved profile of each tip were fitted with a nonlinear regression function to estimate the curvature radius of the tip. The results show that the estimated radius of the coated tips is in the range of nominal values provided by the tip manufacturer, while the estimated radius of the uncoated Si tip is bigger than the nominal radius because of tip blunting during the scan. However, this method yields an accurate estimate of the tip radius with a low root mean squared error of the curve fitting results.

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来源期刊
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.70
自引率
3.20%
发文量
109
审稿时长
2 months
期刊介绍: The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.
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