通过低温溅射在氮化镓上生长的外延 ScAlN 薄膜的结构特征

IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED
A. Kobayashi, Yoshio Honda, Takuya Maeda, Tomoya Okuda, K. Ueno, Hiroshi Fujioka
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引用次数: 0

摘要

ScAlN因其强大的压电和铁电特性而获得了大量关注,有望用于各种电子设备应用。然而,其结构属性和物理性质之间的相互作用仍然知之甚少。利用高分辨率x射线衍射、互反空间映射和机器学习分析揭示了Sc成分、晶格常数和薄膜应变之间的相关性。我们的机器学习模型预测了在不同条件下在GaN上生长的ScAlN的c轴晶格常数,并表明溅射允许在很宽的成分范围内相干生长。这些发现促进了对ScAlN的理解,并为基于ScAlN的器件的研究和开发提供了有价值的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural characterization of epitaxial ScAlN films grown on GaN by low-temperature sputtering
ScAlN has garnered substantial attention for its robust piezoelectric and ferroelectric properties, holding promise for diverse electronic device applications. However, the interplay between its structural attributes and physical properties remains poorly understood. Correlations between Sc composition, lattice constants, and film strains were revealed utilizing high-resolution X-ray diffraction, reciprocal space mapping, and machine learning analyses. Our machine-learning model predicted c-axis lattice constants of ScAlN grown on GaN under various conditions and suggested that sputtering permits coherent growth over a wide compositional range. These findings advance the understanding of ScAlN and provide valuable insights for the research and development of ScAlN-based device.
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来源期刊
Applied Physics Express
Applied Physics Express 物理-物理:应用
CiteScore
4.80
自引率
8.70%
发文量
310
审稿时长
1.2 months
期刊介绍: Applied Physics Express (APEX) is a letters journal devoted solely to rapid dissemination of up-to-date and concise reports on new findings in applied physics. The motto of APEX is high scientific quality and prompt publication. APEX is a sister journal of the Japanese Journal of Applied Physics (JJAP) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).
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