基于 SnO₂ 纳米纤维的晶闸管实验演示及其纳米电子应用的数据驱动建模

Chip Pub Date : 2023-12-01 DOI:10.1016/j.chip.2023.100075
Soumi Saha , Madadi Chetan Kodand Reddy , Tati Sai Nikhil , Kaushik Burugupally , Sanghamitra DebRoy , Akshay Salimath , Venkat Mattela , Surya Shankar Dan , Parikshit Sahatiya
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引用次数: 0

摘要

本文展示了基于一维二氧化锡纳米纤维的忆阻器的制造、表征、数据驱动建模和实际应用,其中一维二氧化锡活性层夹在银(Ag)和铝(Al)电极之间。该器件具有极高的 ROFF:RON∼104 (ION:IOFF∼105)、10 mV/dec 的出色激活斜率、较低的设定电压 VSET∼1.14 V 以及良好的重复性。本文从物理角度解释了基于层状二氧化锡纳米纤维的忆阻器的传导机制。由纳米纤维组成的导电网络在忆阻器的作用中起着至关重要的作用,因为更多的导电路径可以促进电子载流子的跳跃。利用紫外光电子能谱(UPS)实验提取的能带结构有力地支持了本文的观点。我们利用不同的流行算法,如多项式回归(Polynomial Regression)、支持向量回归(SVR)、k Nearest Neighbors(kNN)和人工神经网络(ANN),为制造的忆阻器建立了一个多项式辅助、数据驱动的模型,以对制造的器件数据进行建模。我们提出了两种类型的人工神经网络模型(I 型和 II 型)算法,并用详细的流程图加以说明,以便对制造的忆阻器进行建模。与标准 ML 技术进行的基准测试表明,第二类 ANN 算法的平均绝对百分比误差 (MAPE) 为 0.0175,R2 得分高达 98%。我们还利用使用相同制造配方制造的类似新型忆阻器的表征结果进一步验证了所提出的数据驱动模型,结果令人满意。最后,我们应用 ANN II 模型设计并实现了简单的 AND & OR 逻辑功能,使用制造的忆阻器达到了预期的接近理想的特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental demonstration of SnO₂ nanofiber-based memristors and their data-driven modeling for nanoelectronic applications

This paper demonstrated the fabrication, characterization, data-driven modeling, and practical application of a 1D SnO2 nanofiber-based memristor, in which a 1D SnO2 active layer was sandwiched between silver (Ag) and aluminum (Al) electrodes. This device yielded a very high ROFF : RON of ∼104 (ION : IOFF of ∼105) with an excellent activation slope of 10 mV/dec, low set voltage of VSET ∼ 1.14 V and good repeatability. This paper physically explained the conduction mechanism in the layered SnO2 nanofiber-based memristor. The conductive network was composed of nanofibers that play a vital role in the memristive action, since more conductive paths could facilitate the hopping of electron carriers. Energy band structures experimentally extracted with the adoption of ultraviolet photoelectron spectroscopy strongly support the claims reported in this paper. An machine learning (ML)–assisted, data-driven model of the fabricated memristor was also developed employing different popular algorithms such as polynomial regression, support vector regression, k nearest neighbors, and artificial neural network (ANN) to model the data of the fabricated device. We have proposed two types of ANN models (type I and type II) algorithms, illustrated with a detailed flowchart, to model the fabricated memristor. Benchmarking with standard ML techniques shows that the type II ANN algorithm provides the best mean absolute percentage error of 0.0175 with a 98% R2 score. The proposed data-driven model was further validated with the characterization results of similar new memristors fabricated adopting the same fabrication recipe, which gave satisfactory predictions. Lastly, the ANN type II model was applied to design and implement simple AND & OR logic functionalities adopting the fabricated memristors with expected, near-ideal characteristics.

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